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PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD |
FENG Zhongchao; GUO Liang; LIANG Yong; HAN Jian; HOU Wanliang; NING Xiaoguang (Institute of Metal Resarch; Academia Sinica; Shenyang) |
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Cite this article:
FENG Zhongchao; GUO Liang; LIANG Yong; HAN Jian; HOU Wanliang; NING Xiaoguang (Institute of Metal Resarch; Academia Sinica; Shenyang). PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD. Acta Metall Sin, 1992, 28(8): 67-71.
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Abstract A superhard α-Si_3N_4 film, deposited on metal substrate, was made by laser chemical vapour deposition adopting a kW-level high power CO_2 laser, Most films are of fine grain Si_3N_4. They join the metal substrate in strong bond. The films have super hardness, excellent resistances to wear and corrosion, etc. Their thickness may be controlled within 5—30μm.
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Received: 18 August 1992
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1 冯钟潮.全国激光涂层科学与技术研讨会文集,沈阳,1991:87-95 2 Sugimura A, Fukuda Y, Hanabusa M. J Appl Phys, 1987; 62:3222 3 Pan E T-S, Flint J H, Adler D, Haggerty J S. J Appl Phys, 1987; 61:4535 4 冯钟潮,梁勇,郭良,佟百运,韩健.全国首届激光加工学术讨论会论文集,北京,1989:113-117 5 Feng Zhongchao, Liang Yong, Guo Liang, Tong Baiyun, Han Jian. In: Huang Liji ed., Thin Films and Beam-Solid Interactions, CMRS Int. 1990 Conf, Vol. 4, Beijing, 18-22 June, 1990, Amsterdam: North-Holland. 1991: 459-463Z |
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