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Acta Metall Sin  1992, Vol. 28 Issue (8): 67-71    DOI:
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PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD
FENG Zhongchao; GUO Liang; LIANG Yong; HAN Jian; HOU Wanliang; NING Xiaoguang (Institute of Metal Resarch; Academia Sinica; Shenyang)
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FENG Zhongchao; GUO Liang; LIANG Yong; HAN Jian; HOU Wanliang; NING Xiaoguang (Institute of Metal Resarch; Academia Sinica; Shenyang). PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD. Acta Metall Sin, 1992, 28(8): 67-71.

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Abstract  A superhard α-Si_3N_4 film, deposited on metal substrate, was made by laser chemical vapour deposition adopting a kW-level high power CO_2 laser, Most films are of fine grain Si_3N_4. They join the metal substrate in strong bond. The films have super hardness, excellent resistances to wear and corrosion, etc. Their thickness may be controlled within 5—30μm.
Key words:  laser chemical vapour deposition      Si_3N_4 film      microstructure      hardness      wear resistance      corrosion resistance     
Received:  18 August 1992     
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