CONCENTRATION DISTRIBUTION OF ALLOYINGELEMENT IN SURFACE LAYER OF Ti ALLOY MELTS

Acta Metall Sin

1991, Vol. 27

Issue (5): 141-143 DOI:

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CONCENTRATION DISTRIBUTION OF ALLOYINGELEMENT IN SURFACE LAYER OF Ti ALLOY MELTS

KONG Fanya;YANG Kenu;LU Yong'an;SUN Shuxue Institute of Metal Research; Academia Sinica; Shenyang

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KONG Fanya;YANG Kenu;LU Yong'an;SUN Shuxue Institute of Metal Research; Academia Sinica; Shenyang. CONCENTRATION DISTRIBUTION OF ALLOYINGELEMENT IN SURFACE LAYER OF Ti ALLOY MELTS. Acta Metall Sin, 1991, 27(5): 141-143.

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Abstract An EPMA was carried out of the concentration distribution of alloying eleme1ts,such as Al, Sn, V, Si and Mo, in surface layer of molten Ti alloy, TC4, TA7 or TC9, which was melted and evaporized by electron beam in water cooling copper crucible. The activity coefficient of the alloying elements was calculated as: γ_(Al)—0.009—0.018 and γ_(Sn)=0.066—0. 123 at 1921—2106℃, γ_v=0.713 at 2021℃, γ_(Si)=0.020, γ_(Mo)=0.913 at 1921℃. The controlling step of evaporation rate of the alloying element Al, Sn, V, Si or Mo was also discussed in the light of relevant evaporation activation energy of such alloying element.

Key words: Titanium alloy evaporation activity coefficient surface concentration

Received: 18 May 1991

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1 Mitchell A, Takagi K. In: Lutjering G ed, Titanium Science and Technology Vol. Ⅰ, International Conference on Titanium, (5th, 1984) , Oberursel: Deutsche Gesellschaft fur Metallkurde 1985: 127
2 Yang Kenu, Lu Yong'an, Zhao Changji, Zhang Wanxiang, Sun Shuxue, Kong Fanya, Sun Congxi. Proc 10th Int Conf on Vacuum Metallurgy, Jun., 11--15, 1990, Beijing, China
3 冶金工业部金属研究所.见:难熔金属文集编辑组编,难熔金属文集(第一分册).上海:上海科学技术情报所,1976:121
4 Winkler O, Bakish R. Vacuum Metallurgy, Amsterdam: Elsevier, 1971: 32

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