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金属学报  2018, Vol. 54 Issue (3): 463-469    DOI: 10.11900/0412.1961.2017.00121
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离子镀过程中基体“热影响区”的演变及其对镀层的影响
郭腾1, 李洪涛2, 蒋百灵1,2(), 邢益彬2, 张新宇2
1 西安理工大学材料科学与工程学院 西安 710048
2 南京工业大学材料科学与工程学院 南京 211816
Evolution of Substrate "Heat Affected Zone" in Ion Plating and Its Effect on Coatings
Teng GUO1, Hongtao LI2, Bailing JIANG1,2(), Yibin XING2, Xinyu ZHANG2
1 School of Materials Science and Engineering, Xi′an University of Technology, Xi'an 710048, China;
2 School of Materials Science and Engineering, Nanjing Tech University, Nanjing 211816, China
引用本文:

郭腾, 李洪涛, 蒋百灵, 邢益彬, 张新宇. 离子镀过程中基体“热影响区”的演变及其对镀层的影响[J]. 金属学报, 2018, 54(3): 463-469.
Teng GUO, Hongtao LI, Bailing JIANG, Yibin XING, Xinyu ZHANG. Evolution of Substrate "Heat Affected Zone" in Ion Plating and Its Effect on Coatings[J]. Acta Metall Sin, 2018, 54(3): 463-469.

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摘要: 

以淬火态40CrNiMoA为基材,研究了靶功率密度对“热影响区”升温幅度、区域尺度及镀层结构的影响规律。结果表明,随着靶功率密度从20.61 W/cm2提高到143.01 W/cm2,不仅与镀层比邻的基体温度从310 ℃升高到525 ℃、“热影响区”的尺度从0.37 mm增加到2.51 mm,而且纯Ti镀层的择优取向由(002)转变为(110),平均晶粒尺寸由9.9 nm增大至19.5 nm,表面粗糙度先减小后增大。同时,当基体温度大于300 ℃时,镀层的内应力随着晶格微观缺陷的消除而释放。

关键词 离子镀技术热影响区Ti镀层组织结构内应力    
Abstract

In the process of depositing coatings on the surface of metal substrates via ion plating, substrate temperature increases due to the bombardment of deposited particles and the heat radiation of discharge target, forming "heat affected zone" where substrate temperature gradually reduces from the surface. In this work, quenched 40CrNiMoA was prepared as substrate to discuss about the influence of target power density on the temperature rising range, region scale of "heat affected zone" and microstructure of Ti coating. The results show that the traditional metal heat treatment method can accurately characterize temperature rising range and region scale of "heat affected zone". And, with target power density increases from 20.61 W/cm2 to 143.01 W/cm2, substrate temperature ranges from 310 ℃ to 525 ℃, the region scale of "heat affected zone" reaches to 2.51 mm. Also, the preferential orientation of Ti coating changes from (002) to (110), the average grain size significantly increases from 9.9 nm to 19.5 nm, the surface roughness declines first and then increases slightly. In addition, the internal stress releases gradually for elimination of lattice defects when substrate temperature is above 300 ℃.

Key wordsion plating    heat affected zone    Ti coating    microstructure    internal stress
收稿日期: 2017-04-07     
基金资助:资助项目 国家自然科学基金项目No.51401106
作者简介:

作者简介 郭 腾,女,1990年生,硕士生

图1  淬火态40CrNiMoA显微硬度随回火温度的变化
图2  不同靶功率密度下镀层与基体界面下方沿纵深方向的显微硬度分布
图3  不同靶功率密度下比邻镀层的基体组织形貌
图4  不同靶功率密度下镀层与基体界面下方沿纵深方向的温度分布
PA / (Wcm-2) Microhardness / MPa T / ℃ σ / GPa
20.61 512 310 -2.2
67.07 468 380 -1.0
97.50 422 445 -0.6
129.78 404 465 -0.5
130.01 385 500 -0.6
143.01 355 525 -0.9
表1  不同靶功率密度下比邻镀层的基体温度和镀层内应力
PA / (Wcm-2) TC(100) TC(002) TC(101) TC(102) TC(110) TC(103) TC(112) D / nm
20.61 0.095 0.483 0.055 0.194 - 0.172 - 9.9
67.07 0.134 0.071 0.106 0.086 0.366 0.086 0.152 14.8
97.50 0.090 0.077 0.098 0.096 0.418 0.081 0.139 15.7
129.78 0.108 0.088 0.102 0.085 0.403 0.076 0.139 16.3
130.01 0.147 0.099 0.098 0.089 0.342 0.105 0.120 16.5
143.01 0.217 0.085 0.137 0.162 0.164 - 0.234 19.5
表2  不同靶功率密度下纯金属Ti镀层的织构系数和平均晶粒尺寸
图5  不同靶功率密度下纯金属Ti镀层的XRD谱
图6  不同靶功率密度下纯金属Ti镀层的表面形貌
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