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金属学报  2011, Vol. 47 Issue (10): 1348-1354    DOI: 10.3724/SP.J.1037.2011.00246
  论文 本期目录 | 过刊浏览 |
Cu/X(X=Cr, Nb)纳米多层膜力/电学性能的尺度依赖性
张金钰,张欣,牛佳佳,刘 刚,张国君, 孙 军
西安交通大学金属材料强度国家重点实验室, 西安 710049
LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X (X=Cr, Nb) NANOSTRUCTURED METALLIC MULTILAYERS
ZHANG Jinyu, ZHANG Xin, NIU Jiajia, LIU Gang, ZHANG Guojun, SUN Jun
State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049
全文: PDF(1074 KB)  
摘要: 利用纳米压痕实验以及四探针法, 系统研究了相同层厚Cu/X(X=Cr, Nb)纳米金属多层膜的力学性能(强/硬度)和电学性能(电阻率)的尺度依赖性. 微观分析表明: Cu/X(多层膜调制结构清晰, Cu层沿{111}面择优生长, X(层沿{110}面择优生长.纳米压入结果表明, Cu/X(多层膜的强度依赖于调制周期, 并随调制周期的减小而增加. 多层膜变形机制在临界调制周期(λc≈25 nm)由Cu层内单根位错滑移转变为位错切割界面. 多层膜的电阻率不仅与表面/界面以及晶界散射相关, 而且在小尺度下受界面条件显著影响. 通过修正的FS-MS模型可以量化界面效应对多层膜电阻率的影响. Cu/$X$纳米多层膜可以通过调控微观结构实现强度-电导率的合理匹配.
关键词 Cu/Cr Cu/Nb 纳米多层膜 强度 电阻率 尺寸效应    
Abstract:By using nanoindentation test and four point probe method, the length scaled dependent mechanical property (hardness/strength) and electrical property (resistivity) of Cu/X(X=Cr, Nb) nanostructured metallic multilayers with equal individual layer thickness were systematically investigated. It is revealed from the microstructural analysis that the modulation structure of Cu/X metallic multilayers is clear, and the preferred growth planes of Cu layer and X layer are {111} and {110}, respectively. The indentation test shows that the hardness/strength of the multilayers increases with reducing modulation period λ. The deformation mechanism of the multilayers transits from the glide of single dislocation in a Cu layer to the interface cutting at a critical modulation period λcc ≈25 nm). The resistivity of Cu/X multilayers is not only related to the scattering of conduction electrons at surfaces/interfaces and grain boundaries, but also affected by the interface condition at small scale. This significant interface effect on the length scale–dependent resistivity is assessed using a modified FS–MS model. The best combination of strength–resistivity can be achieved by tailoring the microstructure of Cu/X nanostructured metallic multilayers.
Key wordsCu/Cr    Cu/Nb    nanostructured multilayer    strength    resistivity    size effect
收稿日期: 2011-04-19     
基金资助:

国家重点基础研究发展计划项目2010CB631003和国家自然科学基金项目50971097资助

通讯作者: 刘刚     E-mail: jinyuzhang@stu.xjtu.edu.cn
Corresponding author: LIU Gang     E-mail: jinyuzhang@stu.xjtu.edu.cn
作者简介: 张金钰, 男, 1982年生, 博士生

引用本文:

张金钰 张欣 牛佳佳 刘刚 张国君 孙军. Cu/X(X=Cr, Nb)纳米多层膜力/电学性能的尺度依赖性[J]. 金属学报, 2011, 47(10): 1348-1354.
ZHANG Jin-Yu, ZHANG Jin-Yu, LIU Gang, ZHANG Guo-Jun, XUN Jun. LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X (X=Cr, Nb) NANOSTRUCTURED METALLIC MULTILAYERS. Acta Metall Sin, 2011, 47(10): 1348-1354.

链接本文:

https://www.ams.org.cn/CN/10.3724/SP.J.1037.2011.00246      或      https://www.ams.org.cn/CN/Y2011/V47/I10/1348

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