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| EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CNx FILMS DEPOSITED BY PULSED BIAS |
| Hong-Kai LI;;;; |
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Cite this article:
Hong-Kai LI. EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CNx FILMS DEPOSITED BY PULSED BIAS. Acta Metall Sin, 2008, 44(8): 917-921 .
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Abstract The uniform、smooth and dense CNx fllms with different nitrogen content were deposited on cemented carbide substrate at different nitrogen flow rate by pulsed bias arc ion plating. The surface morphology、composition、structure、hardness and elastic modulus of CNx films were investigated by Scanning electron microscopy(SEM), Glancing incidence X-ray diffraction(GIXRD), X-ray photoelectron spectroscopy(XPS)、Raman spectra and Nano-indentation, respectively. The result show that the nitrogen content in the CNx films increase linearly and then slowly with the nitrogen flow rate increasing. The X-ray diffraction result indicates that the deposited films were amorphous. The hardness and elastic modulus increase and then decrease with nitrogen content increasing. The hardness and elastic modulus of the films with the nitrogen content of 8.1(at)% has a maximum value of 32.1GPa and 411.8GPa, respectively. The Raman spectra results suggest that the deposited films have the typical characteristic of diamond-like carbon films. The ID/IG ratio decrease and then increase with increasing nitrogen content and the minimum value, which corresponds to the highest sp3 content, was obtained at nitrogen content of 8.1%. The change of sp3 content by adjusting the nitrogen content in the CNx films is the only factor that influence the hardness of the films.
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Received: 14 January 2008
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