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Acta Metall Sin  1988, Vol. 24 Issue (6): 443-446    DOI:
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TEM OBSERVATION OF ION-PLATED Al FILM ON Ni SUBSTRATE
WAN Lijun;CHEN Baoqing;GUO Kexin Dalian Maritime University Dalian Institute of Technology K. H. Kuo Institute of Metal Research; Academia Sinica; Shenyang
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WAN Lijun;CHEN Baoqing;GUO Kexin Dalian Maritime University Dalian Institute of Technology K. H. Kuo Institute of Metal Research; Academia Sinica; Shenyang. TEM OBSERVATION OF ION-PLATED Al FILM ON Ni SUBSTRATE. Acta Metall Sin, 1988, 24(6): 443-446.

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Abstract  A new phase is found at the interface between Al film and Ni substrate when thetime of ion-plating has come to 5 min. And it is identified to be body centered tetragonal latticewith the constants a=b=0.588 nm, c=0.480 nm. The varieties of the microstractures and phases withthe ion-plating time are observed. Based on these results, the ion-plating film formation mechanismis also discussed.
Key words:  magentron sputtering      ion-plating      microstructure      plated film     
Received:  18 June 1988     

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https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1988/V24/I6/443

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