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| STUDY ON PREPARATION AND PROPERTIES OF AMORPHOUS Al2O3 THIN FILMS BY RADIO FREQUENCY MAGNETRON SPUTTERING FROM POWDER TARGET |
Fayu WU1,Jianwei LI1,Yi QI2,Wutong DING3,Ziming FAN1,Yanwen ZHOU1( ) |
1) School of Materials and Metallurgy, University of Science and Technology Liaoning, Anshan 114051, China
2) Jinan Casting & Forging Center, SINOTRUK (Hong Kong) Limited, Zhangqiu 250200, China ;
3) School of Materials Science and Engineering, Shenyang University of Technology, Shenyang 110870, China |
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Cite this article:
Fayu WU,Jianwei LI,Yi QI,Wutong DING,Ziming FAN,Yanwen ZHOU. STUDY ON PREPARATION AND PROPERTIES OF AMORPHOUS Al2O3 THIN FILMS BY RADIO FREQUENCY MAGNETRON SPUTTERING FROM POWDER TARGET. Acta Metall Sin, 2016, 52(12): 1595-1600.
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Abstract Al2O3 thin films are widely applied in mechanic, optic and electronic fields due to their excellent properties. Among many deposition techniques, magnetron sputtering is regarded as one of the most practical approaches for preparing Al2O3 films. In sputtering process, the use of powder targets could offer the advantages of easily variable and controllable composition and low cost. However, it is not yet known well enough how to determine sputtering parameters, microstructure and properties of Al2O3 films from powder targets. In this work, Amorphous Al2O3 films were prepared by radio frequency magnetron sputtering process in which high pure Al2O3 powder was used as the target material. The effects and mechanism of the sputtering parameters on the microstructures, surface morphology and optical properties of amorphous Al2O3 films were analyzed by XRD, AFM, surface profile, UV-Vis spectroscopy and so on. Considering used as the packaging material, the antimicrobial performance of amorphous Al2O3 films was also studied. The experimental results showed that: increasing the oxygen flow, decreasing the sputtering power and shortening the sputtering time could make the particle size and roughness of amorphous Al2O3 films lower while depressing the deposition rate of amorphous Al2O3 films. Moreover, the increase of the oxygen flow and decrease of the sputtering time would widen the band gap which the maximum was up to 4.21 eV, and heighten the transmittance of the visible light which was beyond 90%. The antibacterial rate of amorphous Al2O3 films under the natural light after 24 h was up to 98.6%, which reflected the photocatalytic characteristics of the antimicrobial mechanism.
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Received: 15 April 2016
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| Fund: Supported by National Natural Science Foundation of China (Nos.51372109 and 51502126) and Foundation of Educational Department of Liaoning (No.L2015260) |
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