Preparation of Ti(CxN1-x) thick films on titanium by plasma electrolytic carbonitriding

Acta Metall Sin

2008, Vol. 44

Issue (9): 1105-1110 DOI:

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Preparation of Ti(CxN1-x) thick films on titanium by plasma electrolytic carbonitriding

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新疆大学机械工程学院

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;. Preparation of Ti(CxN1-x) thick films on titanium by plasma electrolytic carbonitriding. Acta Metall Sin, 2008, 44(9): 1105-1110 .

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Abstract ABSTRACT Porous nanocrystalline Ti(CxN1-x) thick films which firmly bond to the substrate were obtained on commercially pure titanium by plasma electrolytic carbonitriding. The evolutions of the microstructure and phase compositions of the PECN modified layers with the treatment time were investigated. The results show that the thickness, ratios of C/N and pores sizes of the Ti(CxN1-x) films tend to increase with the discharge time. When discharge-treated for 150 minutes, the film is about 15 冚m thick and exhibits nanocrystalline characterization with grain size of 40-60 nm. The TiH2-riched layer which was induced by the permeation of hydrogen during the PECN locates beneath the Ti(CxN1-x) film, and it can be completely removed by subsequent vacuum annealing treatment while the composition and the surface morphology of the Ti(CxN1-x) film keep unchanged.

Key words: Plasma electrolytic carbonitriding titanium Ti(CxN1-x) films

Received: 14 January 2008

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TG174.44

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