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INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON MICROSTRUCTURE AND FRICTION PERFORMANCE OF TIN FILM DEPOSITED BY ARC ION PLATING |
XIAO Jinquan1), LANG Wenchang1, 2), ZHAO Yanhui1), GONG Jun1), SUN Chao1), WEN Lishi1) |
1) Division of Surface Engineering of Materials, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016
2) Key Lab of Material Processing and Mould Technology, Wenzhou Vocational $\&$ Technical College, Wenzhou 325035 |
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Cite this article:
XIAO Jinquan LANG Wenchang ZHAO Yanhui GONG Jun SUN Chao WEN Lishi. INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON MICROSTRUCTURE AND FRICTION PERFORMANCE OF TIN FILM DEPOSITED BY ARC ION PLATING. Acta Metall Sin, 2011, 47(5): 566-572.
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Abstract Arc ion plating (AIP) has been widely used in the deposition of various kinds of thin solid films. In AIP process, cathode spot motion is the key factor because it affects the physical characteristics of arc plasma, the utilization of cathode materials, the ejection of macroparticles (MPs) and the quality of subsequent films. It has been found that the cathode spot can be steered by an external magnetic field, such as an axisymmetric magnetic field (AMF). In this work, a new AMF produced by using an adjustable electromagnetic coil associated with a concentric magnetic flux guider was applied to the cathode surface to deposit TiN films, and it was focused on the influence of the AMF on the content and size of MPs, microstructure and friction performance of TiN films. The results show that the size and number of MPs decrease significantly with the increase in the transverse component of AMF. Meanwhile, the TiN film (111) preferred orientation enhances and its grain size decreases. Furthermore, the friction coefficient of films reduces and the wear resistance of films increases.
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Received: 22 December 2010
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Fund: Supported by National Natural Science foundation of China (No.50801062) |
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