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Acta Metall Sin  2017, Vol. 53 Issue (2): 183-191    DOI: 10.11900/0412.1961.2016.00358
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Strain Rate Sensitivity of Cu/Ni and Cu/NbNanoscale Multilayers
Yao WANG,Xiaoying ZHU(),Guimin LIU,Jun DU
Department of Equipment Remanufacturing Engineering, Academy of Armored Forces Engineering, Beijing 100072, China
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Abstract  

Different from monolayers of same components, nanoscale multilayers have different mechanical properties owing to their relatively high interfacial density, such as extremely high yield strength, high ductility and outstanding wear resistance. Furthermore, their precise modulation period and unique interfacial structures contribute to investigate the plastic deformation mechanism of metal materials. As the plastic deformation behaviors of nanoscale multilayers were reflected in a thermal activation process, strain rate sensitivity index m can be used to characterize the tendency of material strengthening as the strain rate increases. To investigate the impacts of modulation period and interfacial structures upon strain rate sensitivity of nanoscale multilayers, Cu/Ni nanoscale multilayers with different periods (Λ=4 nm, 12 nm, 20 nm) were prepared on Si substrate with e-beam evaporation technologies, while Cu/Nb nanoscale multilayers with different periods (Λ=5 nm, 10 nm, 20 nm) were prepared on Si substrate with magnetron sputtering technologies. Under vacuum conditions, the Cu/Ni nanoscale multilayers of different periods were annealed at 200 and 400 ℃ for 4 h respectively, and the Cu/Nb nanoscale multilayers of different periods were annealed at 200, 400 ℃ and 600 ℃ for 4 h respectively. Microstructures of Cu/Ni and Cu/Nb nanoscale multilayers were characterized with XRD and TEM. Besides, the hardness of nanoscale multilayers was measured by nano-indentation techniques under different loading strain rates (including 0.005, 0.01, 0.05 and 0.2 s-1). The results suggested that strain rate sensitivity was impacted by interfacial structures and grain size. Both increased density of incoherent interfaces and grain size could result in weaker strain rate sensitivity. As the period increases, the density of incoherent interfaces and the grain size of Cu/Ni nanoscale multilayers increased, leading to a decline in the strain rate sensitivity. While for Cu/Nb nano scale multilayers, the density of incoherent interfaces decreased and their grain size was enlarged with longer period, the m value kept unchanged as a result. As the annealing temperature increasing, the strain rate sensitivity of Cu/Ni and Cu/Nb nanoscale multilayers generally tended to decline, which should be ascribed to increased density of incoherent interfaces and grain size in the course of annealing.

Key words:  nanoscale      multilayer,      period,      interface      structure,      strain      rate      sensitivity     
Received:  05 August 2016     
Fund: Supported by National Natural Science Foundation of China (Nos.51401238 and 51102283)

Cite this article: 

Yao WANG,Xiaoying ZHU,Guimin LIU,Jun DU. Strain Rate Sensitivity of Cu/Ni and Cu/NbNanoscale Multilayers. Acta Metall Sin, 2017, 53(2): 183-191.

URL: 

https://www.ams.org.cn/EN/10.11900/0412.1961.2016.00358     OR     https://www.ams.org.cn/EN/Y2017/V53/I2/183

Fig.1  XRD spectra of as deposited (a) and as annealed (b~d) Cu/Ni nanoscale multilayers with Λ=4 nm (b), Λ=12 nm (c) and Λ=20 nm (d) (Λ―period)
Fig.2  XRD spectra of as deposited (a) and as annealed (b~d) Cu/Nb nanoscale multilayers with Λ=5 nm (b), Λ=10 nm (c) and Λ=20 nm (d)
Fig.3  Cross-sectional TEM (a, c) and HRTEM (b, d) images of as deposited (a, b) and 400 ℃ annealed (c, d) Cu/Ni nanoscale multilayers with Λ=12 nm (Inset in Fig.3a shows the SAED patterns, and insets in Figs.3b and d show the inverse fast Flourier transform images)
Fig.4  Cross-sectional TEM images of as deposited Cu/Nb nanoscale multilayers with Λ=5 nm (a) and Λ=20 nm (b), and EDS map scanning morphologies of Cu (c) and Nb (d) elements in the sample with Λ=20 nm (Inset in Fig.4b shows the corresponding SAED pattern)
Fig.5  Strain rate sensitivity m of Cu/Ni nanoscale multilayers with Λ=4, 12 and 20 nm annealed at different temperatures
Fig.6  m of Cu/Nb nanoscale multilayers with Λ=5, 10 and 20 nm annealed at different temperatures
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