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低辐射薄膜TiO2-Ag-TiO2-SiO的纳米尺度显微结构 |
詹倩 于荣 贺连龙 李斗星 郭晓楠 |
中国科学院金属研究所固体原子像开放研究实验室;沈阳110016 |
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引用本文:
詹倩; 于荣; 贺连龙; 李斗星; 郭晓楠 . 低辐射薄膜TiO2-Ag-TiO2-SiO的纳米尺度显微结构[J]. 金属学报, 2001, 37(4): 337-339 .
[1] Dobrowolski J A. In: Bass M, van Stryland E W, WilliansD R, Wolf e W L eds., Handbook of Optics, Vol. I, 2nd ed.,New York: McGraw-Hill, 1995: ch42 [2] Arbab M. MRS Bull, 1997; 9: 27 [3] Finley J J. Thin Solid Films, 1999; 351: 264 [4] Szczyrbowski J, Brauer G, Ruske M, Schilling H, ZmeltyA. Thin Solid Films, 1999; 351: 254 [5] Ross R C, Sherman R, Bunger R A. Sol Enengv Mater,1989; 19: 55 [6] Gillery F H. US Pat, 4 610 771, 1986 [7] Gillery F H, Criss R C, Finley J J. US Pat, 4 716 086,1987Gillery F H, Criss R C, Finley J J. US Pat, 4 786 563,1988 [8] Ohsaki H, Kokubu Y. Thin Solid Films, 1999; 351: 1 [9] Tang W Z. The Preparntion Principles, Technique andApplications of Film Materials. Beijing: MetallurgicalIndustry Press, 1998: 126(唐伟忠 薄膜材料制备原理、技术及应用。北京:冶金工业出版社, 1998: 126)Y |
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