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α-W膜在单晶硅基片上的共格生长及其力电性能的膜厚效应 |
刘明霞;胡永峰;马飞;徐可为 |
西安交通大学金属材料强度国家重点实验室 |
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COHERENT GROWTH OF α-W FILM ON Si WAFER AND ITS THICKNESS DEPENDENT MECHANICAL AND ELECTRICAL PROPERTIES |
Mingxia Liu;Yongfeng Hu;FEI MA;Kewei XU |
西安交通大学金属材料强度国家重点实验室 |
引用本文:
刘明霞; 胡永峰; 马飞; 徐可为 . α-W膜在单晶硅基片上的共格生长及其力电性能的膜厚效应[J]. 金属学报, 2008, 44(5): 631-635 .
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COHERENT GROWTH OF α-W FILM ON Si WAFER AND ITS THICKNESS DEPENDENT MECHANICAL AND ELECTRICAL PROPERTIES[J]. Acta Metall Sin, 2008, 44(5): 631-635 .
[1]Samanta S K,Yoo W J,Samudra G,Tok E S,Bera L K, Balasubramanian N.Appl Phys Lett,2005;87:113110 [2]Shen Y G,Mai Y W,McBride W E,McKenzie D R,Zhang Q C.Appl Phys Lett,1999;75:2211 [3]Haghiri-Gosnet A M,Ladan F R,Mayeux C,Launois H. J Vac Sci Technol,1989;7A:2663 [4]Rossnagel S M,Noyan I C,Cabral C.J Vac Sci Technol, 2002;20B:2047 [5]Kuroda R,Liu Z X,Fukuzawa Y.Suzuki Y,Osamura M, Wang S N,Naotaka O,Teruhisa O,Takahiro M,Yasushi H,Yasuhiko N,Hisao T,Yunosuke M.Thin Solid Films, 2004;461:34 [6]Sadowski J T,Nagao T,Yaginuma S,Fujikawa Y,Al- Mahboob A,Nakajima K,Sakurai T,Thayer G E,Tromp R M.Appl Phys Lett,2005;86:073109 [7]Tu J P,Jiang C X,Guo S Y,Fu M F.Mater Lett,2004; 58:1646 [8]Badawi K F,Villain P,Goudeau P,Renault P O.Appl Phys Lett,2002;80:4705 [9]Villain P,Goudeau P,Renault P O,Badawi K F.Appl Phys Lett,2002;81:4365 [10]Kim H K,Huh S H,Park J W,Jeong J W,Lee G H.Chem Phys Lett,2002;354:165 [11]Villain P,Beauchamp P,Badawi K F,Goudeau P,Renault P O.Scr Mater,2004;50:1247 [12]Stoney G G.Proc R Soc London,1909;82A:172 [13]Zhang J M,Xu K W.Acta Phys Sin,2004;53:176 (张建民,徐可为.物理学报,2004;53:176) [14]Janssen G C A M,Dammers A J,Sivel V G M,Wang W R.Appl Phys Lett,2003;83:3287 [15]Misra A,Kung H,Mitchell T E,Nastasi M.J Mater Res, 2000;15:756 [16]Doljack F A,Hoffman R W.Thin Solid Films,1972;11: 71 [17]Naoki W,Kazuo S,Nobuyasu M.Appl Phys Lett,2004; 85:1199 [18]Hu S Y,Chen L Q.Acta Mater,2004;52:3069 |
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