Microstructures and Mechanical Properties of TiN/AlON Nanomultilayers synthesized by Reactive Magnetron Sputtering

Acta Metall Sin

2008, Vol. 44

Issue (2): 193-197 DOI:

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Microstructures and Mechanical Properties of TiN/AlON Nanomultilayers synthesized by Reactive Magnetron Sputtering

Bilong Li;;;Geyang Li

上海交通大学

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Bilong Li; Geyang Li. Microstructures and Mechanical Properties of TiN/AlON Nanomultilayers synthesized by Reactive Magnetron Sputtering. Acta Metall Sin, 2008, 44(2): 193-197 .

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Abstract Ti and Al2O3 targets are used to prepare a series of TiN/AlON nanomultilayers in the gas mixture of Ar and N2 with reactive magnetron sputtering method. The formation conditions of AlON and the effects of thickness of AlON on microstructures and mechanical properties of the multilayers are evaluated and characterized by X-ray energy dispersive spectroscopy, X-ray diffraction, high resolution transmission electron microscopy and nanoindentation. The investigations show that O atom in Al2O3 will be partially replaced with N atom when sputtering Al2O3 target in the gas mixture of Ar and N2, forming amorphous AlON. In TiN/AlON nanomultilayers, when thickness of AlON is less than 0.6nm, AlON, due to the template effect of TiN crystal layer, is forced to crystallize and grow epitaxially with TiN, and the multilayers begin to show superhardness effect with a highest Hv value of 40.5GPa. With further increase of the thickness of AlON, its growth mode changes from crystal to amorphous, therefore destroying the epitaxial structure of multilayeres and leading to a decreased hardness of multilayers.

Key words: TiN/AlON nanomultilayers epitaxial growth crystallization mechanical properties reactive magnetron s

Received: 14 June 2007

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https://www.ams.org.cn/EN/ OR https://www.ams.org.cn/EN/Y2008/V44/I2/193

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