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| Study on the Sensitivity of Mechanical Properties of TiN/Si3N4 Nano-structured Film to Si3N4 Layer Thickness |
| Ge-Yang LI;;; |
| 上海交通大学材料科学与工程学院金属基复合材料国家重点实验室 |
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Cite this article:
Ge-Yang LI. Study on the Sensitivity of Mechanical Properties of TiN/Si3N4 Nano-structured Film to Si3N4 Layer Thickness. Acta Metall Sin, 2007, 43(2): 154-158 .
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Abstract A series of TiN/Si3N4 nano-multilayers with different Si3N4 modulation thickness were reactively deposited by magnetic sputtering in order to study the sensibility of mechanical properties of TiN/Si3N4 multilayers on the change of Si3N4 thickness. The microstructure of the multilayers was characterized with X-ray diffraction, high-resolution transmission electron microscopy and scanning electron microscopy. A nanoindentor was introduced to measure the mechanical properties. Results show that when the thickness is less than 0.7 nm, Si3N4, normally amorphous in deposition state, could form a NaCl-type pseduocrystal structure due to the template effect of TiN crystal layer. Crystallized Si3N4 layers and TiN template layers grow coherently into columnar crystals with (111) preferred orientation. Correspondingly, the hardness of the films was enhanced to a maxim value of 38.5 GPa, showing a superhardness effect. Further increasing Si3N4 layers thickness, the coherent interfaces of the multilayers were damaged and Si3N4 layers become amorphous, accompanying by the decline in the hardness of the coatings.
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Received: 29 May 2006
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