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| Characterization of Microstructure and Hardness of PCVD DepositedTi1-xAlx N Hard Coatings |
| MA Shengli; XU Jian; JIE Wanqi; XU Kewei; M. G. J. Veprek--Heijman;S. Veprek |
| State--Key Laboratory for Mechanical Behavior of Materials; Xi' an Jiaotong University; Xi' an 710049 |
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Cite this article:
MA Shengli; XU Jian; JIE Wanqi; XU Kewei; M. G. J. Veprek--Heijman; S. Veprek. Characterization of Microstructure and Hardness of PCVD DepositedTi1-xAlx N Hard Coatings. Acta Metall Sin, 2004, 40(6): 669-.
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Abstract Ti1-xAlxN hard coatings have been synthesized by direct current (dc) plasma--enhanced chemical vapor deposition (PCVD). Dependences of aluminum content and annealing at elevated temperatures on the microstructure and hardness of Ti1-xAlxN coatings were investigated. The results show that plastic hardness measured by means of indentation test increases with x$increasing up to 0.83 and then decreases. XRD measurements indicate that the coatings with x<0.83 are fcc. solid solution with 3--10 nm grain scale. When x=0.83, relatively soft h--AlN phase is precipitated in Ti1-xAlxN coating, while the coating hardness begins a dramatical decrease. Furthermore, the nano--crystalline structure and high hardness of the coating can keep up to 900℃, which indicates the synthesized coating having good thermal stability.
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Received: 05 June 2003
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