Acta Metall Sin  1997, Vol. 33 Issue (7): 737-741    DOI:

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THE INTERFACIAL ANALYSIS OF MO/SiO_2 MULTILAYERS MIRROR FOR SOFT X-RAY

WANG Fengping;WANG Peixuan;FANG Zhengzhi (University of Science and Technology Beting; Beting 100083); CUI Mingqi;JIANG Xiaoming; MA Hong; (Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039)

WANG Fengping;WANG Peixuan;FANG Zhengzhi (University of Science and Technology Beting; Beting 100083); CUI Mingqi;JIANG Xiaoming; MA Hong; (Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039). THE INTERFACIAL ANALYSIS OF MO/SiO_2 MULTILAYERS MIRROR FOR SOFT X-RAY. Acta Metall Sin, 1997, 33(7): 737-741.

Abstract References Related Articles Recommended Metrics Download:  PDF(457KB)  Export:  BibTeX | EndNote (RIS)       Abstract  Groups of Mo/Sio2 multilayer films were fabricated by magnetron sputter ing in Ar atmosphere. Low angle X-ray diffraction analysis of the multilayers was carried out at the diffusion scattering station of BSRF. The interfacial roughness and periodic structure are investigated through simulation of low angle X-ray diffraction spectra based on the dynamical theory. The periodic structure and composition of Mo/SiO2 multilayers were also characterized with AES. The results show that very good composition modulation struc ture formed, and no obvious diffusion of St and / or O through Mo layers is observed. Key words:  Mo/Sio2 multilayer      magnetron sputtering      interfacial roughness      low angle X-ray diffraction      AES      Received:  18 July 1997      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1997/V33/I7/737 1 Chakrabotry P. Int J Mod Phys, 1991; B 5: 2133 2 Eason R W. TechnicaI Report of Ruther.brd Appleton Laboratory, A4, 1987: 1 3 Okada H, Mayama K, Goto Y, Kusunoki L, Yanagihara M. Appl Opt, 1994; 33: 4219 4 Berning P H. Phys Thin Fdms, 1963, 1. 69 5 Underwood J H, Barbee T W Jr. AIP Conf Proc, 1981, (75): 170 6 Henke B L, Lee P, Tanaka T J, Shimabukuro R L, Fuiikawa B K. A,omic Data and Nuclear Data TabIe, Vol.27, New York' Academic Press, 1982: 1 7 Li Z G, Smith D J, Tsen S-C Y, Boher P, Houdy Ph. J Appl Phys, 1991; 70: 2905 [1] HUANG Ding, QIAO Yanxin, YANG Lanlan, WANG Jinlong, CHEN Minghui, ZHU Shenglong, WANG Fuhui. Effect of Shot Peening of Substrate Surface on Cyclic Oxidation Behavior of Sputtered Nanocrystalline Coating[J]. 金属学报, 2023, 59(5): 668-678. [2] CAO Qingping, LV Linbo, WANG Xiaodong, JIANG Jianzhong. Magnetron Sputtering Metal Glass Film Preparation and the “Specimen Size Effect” of the Mechanical Property[J]. 金属学报, 2021, 57(4): 473-490. [3] LIU Yanmei, WANG Tiegang, GUO Yuyao, KE Peiling, MENG Deqiang, ZHANG Jifu. Design, Preparation and Properties of Ti-B-N Nanocomposite Coatings[J]. 金属学报, 2020, 56(11): 1521-1529. [4] Wentao LI,Zhenyu WANG,Dong ZHANG,Jianguo PAN,Peiling KE,Aiying WANG. Preparation of Ti2AlC Coating by the Combination of a Hybrid Cathode Arc/Magnetron Sputtering with Post-Annealing[J]. 金属学报, 2019, 55(5): 647-656. [5] Shasha YANG,Feng YANG,Minghui CHEN,Yunsong NIU,Shenglong ZHU,Fuhui WANG. Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering[J]. 金属学报, 2019, 55(3): 308-316. [6] Houpu WU,Xiubo TIAN,Xinyu ZHANG,Chunzhi GONG. Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate[J]. 金属学报, 2019, 55(3): 299-307. [7] Huiying SHI, Chao YANG, Bailing JIANG, Bei HUANG, Di WANG. Influences of Target Peak Current Density on the Microstructure and Mechanical Properties of TiN Films Deposited by Dual Pulsed Power Magnetron Sputtering[J]. 金属学报, 2018, 54(6): 927-934. [8] Baiyang LOU,Yuxing WANG. EFFECTS OF Mo CONTENT ON THE MICRO-STRUCTURE AND TRIBOLOGICAL PROPERTIES OF CrMoAlN FILMS[J]. 金属学报, 2016, 52(6): 727-733. [9] Xudong SUI,Guojian LI,Qiang WANG,Xuesi QIN,Xiangkui ZHOU,Kai WANG,Lijian ZUO. PREPARATION OF Ti1-xAlxN COATING IN CUTTING TITANIUM ALLOY AND ITS CUTTING PERFORMANCE[J]. 金属学报, 2016, 52(6): 741-746. [10] QI Dongli, LEI Hao, FAN Di, PEI Zhiliang, GONG Jun, SUN Chao. EFFECT OF Mo CONTENT ON THE MICROSTRUC-TURE AND PROPERTIES OF CrMoN COMPOSITE COATINGS[J]. 金属学报, 2015, 51(3): 371-377. [11] Chao YANG,Bailing JIANG,Lin FENG,Juan HAO. EFFECT OF DISCHARGE CHARACTERISTICS OF TARGET ON IONIZATION AND DEPOSITION OF DEPOSITED PARTICLES[J]. 金属学报, 2015, 51(12): 1523-1530. [12] Wenfang CUI,Dong CAO,Gaowu QIN. MICROSTRUCTURE AND WEAR RESISTANCE OF Ti/TiN MULTILAYER FILMS DEPOSITED BY MAGNETRON SPUTTERING[J]. 金属学报, 2015, 51(12): 1531-1537. [13] Yutian MA,Junbiao LIU,Rongling HUO,Li HAN,Geng NIU. RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING[J]. 金属学报, 2015, 51(11): 1416-1424. [14] Yutian MA,Junbiao LIU,Rongling HUO,Li HAN,Geng NIU. RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING[J]. 金属学报, 2015, 51(11): 1416-1424. [15] WANG Zhenyu, XU Sheng, ZHANG Dong, LIU Xincai, KE Peiling, WANG Aiying. INFLUENCE OF N2 FLOW RATE ON STRUCTURES AND MECHANICAL PROPERTIES OF TiSiN COATINGS PREPARED BY HIPIMS METHOD[J]. 金属学报, 2014, 50(5): 540-546. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed