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Acta Metall Sin  1997, Vol. 33 Issue (6): 667-672    DOI:
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THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS
YIN Renhe; CAO Weimin; LI Yajun(The Electrochemical Research Center; ShanghaiUniversity; Shanghai 201800) LI Zhuotang (Deportment of Materials; Shanghai University)) RONG Guobin (East China University of Science and Technology)
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YIN Renhe; CAO Weimin; LI Yajun(The Electrochemical Research Center; ShanghaiUniversity; Shanghai 201800) LI Zhuotang (Deportment of Materials; Shanghai University)) RONG Guobin (East China University of Science and Technology). THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS. Acta Metall Sin, 1997, 33(6): 667-672.

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Abstract  The defects in Ta2O5 and ZrO2 films prepared by RF sputtering on SUS304stainless steel were studied by CPCD (critical passivation current density) and liquid crystalmethods. In CPCD method a relation between current density if and film thickness wasgiven: If= K(1-0)d. Using DSM (dynamic scattering mode) of liquid crystal, a new methodabout nondestructive testing of film defects was reported. The results of the two methodsshowed a good linear relation.
Key words:  CPCD method      DSM      liquid crystal      oxide film      defect     
Received:  18 June 1997     
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