IN SITU MEASUREMENT OF ELECTRIC CONDUCTIVITY OF ULTRA THIN Al FILM
TANG Zhaolin; HUANG Rongfang; WEN Lishi(Institute of Metal Research;Chinese Academy of Sciences; Shenyang 110015) (Manuscript received 1995-05-04; in revised form 1995-08- 15)
Cite this article:
TANG Zhaolin; HUANG Rongfang; WEN Lishi(Institute of Metal Research;Chinese Academy of Sciences; Shenyang 110015) (Manuscript received 1995-05-04; in revised form 1995-08- 15). IN SITU MEASUREMENT OF ELECTRIC CONDUCTIVITY OF ULTRA THIN Al FILM. Acta Metall Sin, 1996, 32(3): 308-312.
Abstract The electric conductivity of sputtered ultrathin Al films as a function of thickness has been measured in situ during vacuum deposition process. At different stages of growth, the films have the different electric conductivity characteristics. Therotical analysis showed that surface scattering and grain boundary scattering played a main role in size effect of resistivity. Correspondent: TANG Zhaolin, Institute of Corrosion and Protection of Metals, Chinese Academy of Scicnces,Shenyang 110015