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LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X (X=Cr, Nb) NANOSTRUCTURED METALLIC MULTILAYERS |
ZHANG Jinyu, ZHANG Xin, NIU Jiajia, LIU Gang, ZHANG Guojun, SUN Jun |
State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049 |
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Cite this article:
ZHANG Jinyu ZHANG Xin NIU Jiajia LIU Gang ZHANG Guojun SUN Jun. LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X (X=Cr, Nb) NANOSTRUCTURED METALLIC MULTILAYERS. Acta Metall Sin, 2011, 47(10): 1348-1354.
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Abstract By using nanoindentation test and four point probe method, the length scaled dependent mechanical property (hardness/strength) and electrical property (resistivity) of Cu/X(X=Cr, Nb) nanostructured metallic multilayers with equal individual layer thickness were systematically investigated. It is revealed from the microstructural analysis that the modulation structure of Cu/X metallic multilayers is clear, and the preferred growth planes of Cu layer and X layer are {111} and {110}, respectively. The indentation test shows that the hardness/strength of the multilayers increases with reducing modulation period λ. The deformation mechanism of the multilayers transits from the glide of single dislocation in a Cu layer to the interface cutting at a critical modulation period λc (λc ≈25 nm). The resistivity of Cu/X multilayers is not only related to the scattering of conduction electrons at surfaces/interfaces and grain boundaries, but also affected by the interface condition at small scale. This significant interface effect on the length scale–dependent resistivity is assessed using a modified FS–MS model. The best combination of strength–resistivity can be achieved by tailoring the microstructure of Cu/X nanostructured metallic multilayers.
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Received: 19 April 2011
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Fund: Supported by National Basic Research Program of China (No.2010CB631003) and National Natural Science Foundation of China (No.50971097) |
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