|
|
电流密度对直流电解沉积纳米孪晶Cu微观结构的影响 |
金帅,潘庆松,卢磊 |
中国科学院金属研究所沈阳材料科学国家(联合)实验室, 沈阳 110016 |
|
MICROSTRUCTURE DEPENDENCE OF DIRECTCURRENT ELECTRODEPOSITED BULK Cu WITH PREFERENTIALLY ORIENTED NANOTWINS ON THE CURRENT DENSITIES |
JIN Shuai, PAN Qingsong, LU Lei |
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 |
引用本文:
金帅,潘庆松,卢磊. 电流密度对直流电解沉积纳米孪晶Cu微观结构的影响[J]. 金属学报, 2013, 49(5): 635-640.
JIN Shuai,
PAN Qingsong,
LU Lei.
MICROSTRUCTURE DEPENDENCE OF DIRECTCURRENT ELECTRODEPOSITED BULK Cu WITH PREFERENTIALLY ORIENTED NANOTWINS ON THE CURRENT DENSITIES[J]. Acta Metall Sin, 2013, 49(5): 635-640.
[1] Koch C C, Morris D G, Lu K, Inoue A. MRS Bull, 1999; 24: 54 [2] Meyers M A, Mishra A, Benson D J. Prog Mater Sci, 2006; 51: 427 [3] Dao M, Lu L, Asaro R J, De Hosson J T M, Ma E. Acta Mater, 2007; 55: 4041 [4] Hodge A M, Wang Y M, Barbee T W. Mater Sci Eng, 2006; A429: 272 [5] Lu K, Lu L, Suresh S. Science, 2009; 324: 349 [6] Lu L, Shen Y F, Chen X H, Qian L H, Lu K. Science, 2004; 304: 422 [7] Lu L, Chen X, Huang X, Lu K. Science, 2009; 323: 607 [8] Lu L, You Z S, Lu K. Scr Mater, 2012; 66: 837 [9] Li X Y, Wei Y J, Lu L, Lu K, Gao H J. Nature, 2010; 464: 877 [10] You Z S, Lu L, Lu K. Acta Mater, 2011; 59: 6927 [11] Chen X H, Lu L, Lu K. Scr Mater, 2011; 64: 311 [12] Pan Q S, Lu Q H, Lu L. Acta Mater, 2013; 61: 1383 [13] You Z S, Li X Y, Lu Q H, Gao H, Lu L. Acta Mater, 2013; 61: 217 [14] Zhang X, Wang H, Chen X H, Lu L, Lu K, Hoagland R G, Misra A. Appl Phys Lett, 2006; 88: 173116 [15] Li Y S, Tao N R, Lu K. Acta Mater, 2008; 56: 230 [16] Zhang X, Misra A, Wang H, Shen T D. Acta Mater, 2004; 52: 995 [17] Zhang X, Anderoglu O, Misra A, Wang H. Appl Phys Lett, 2007; 90: 153101 [18] Dahlgren S D. J Vac Sci Technol, 1974; 11: 832 [19] Dahlgren S D, Nicholson W L, Merz M D, Bollmann W, Devlin J F, Wang R. Thin Solid Films, 1977; 40: 345 [20] Li D. Principles of Electrochemistry. Beijing: Beijing University of Aeronautics and Astronautics Press, 1999: 419 (李 荻. 电化学原理. 北京: 北京航空航天大学出版社, 1999: 419) [21] Fullman R L, Fisher J C. Appl Phys Lett, 1951; 22: 1350 [22] Xu D, Kwan W L, Chen K, Zhang X, Ozolins V, Tu K N. Appl Phys Lett, 2007; 91: 254105 [23] Xu D, Sriram V, Ozolins V, Yang J M, Tu K N, Stafford G R, Beauchamp C. Appl Phys Lett, 2009; 105: 023521 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|