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光激发荧光谱术分析Co-Cr-Al(Y)纳米涂层的氧化 I. Al2O3膜应力测量与分析 |
彭晓; 王福会; D.R. Clarke |
中国科学院金属研究所金属腐蚀与防护国家重点实验室; 沈阳 110016 |
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引用本文:
彭晓; 王福会; D.R.Clarke . 光激发荧光谱术分析Co-Cr-Al(Y)纳米涂层的氧化 I. Al2O3膜应力测量与分析[J]. 金属学报, 2003, 39(10): 1060-1064 .
[1] Peng X, Clarke D R. J Am Ceram Soc, 2000; 83: 1165 [2] Lipkin D M, Clarke D R, Schaffer H, Adar F. Appl Phys Lett, 1997; 70: 2550 [3] Tolpygo V K, Dryden J, Clarke D R. Acta Mater, 1998; 46: 927 [4] Tolpygo V K, Clarke D R. Materials at High Temperatures, 2000; 17: 59 [5] Wang F H, Lou H Y. Mater Sci Eng, 1990; A129: 279 [6] Peng X, Wang F H, Clarke D R. Acta Metall Sin, 2003;39: 1055(彭晓,王福会,Clarke D R.金属学报,2003;39:1055) [7] Doychak J, Smailek J L, Mitchell T E. Met Trans, 1989;20A: 499 [8] Lipkin D M, Clarke D R, Hollatz M, Bobeth M, Pompe W. 1997; 39: 231 [9] Peng X, Wang F H. Corros Sci, 2003; 45: 2293T |
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