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Cu/Cu(Ge, Zr)/SiO2/Si多层膜界面可控反应及热稳定性研究 |
张彦坡1),任丁1),林黎蔚1),杨斌1),王珊玲2),刘波1),徐可为3) |
1) 四川大学原子核科学技术研究所 辐射物理与技术教育部重点实验室, 成都 610064
2) 四川大学分析测试中心, 成都 610064
3) 西安交通大学材料科学与工程学院金属材料强度国家重点实验室, 西安 710049 |
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CONTROLLED REACTION ON INTERFACE OF Cu/Cu(Ge, Zr)/SiO2/Si MULTILAYER FILM AND ITS THERMAL STABILITY |
ZHANG Yanpo1), REN Ding1), LIN Liwei1),YANG Bin1), WANG Shanling2),LIU Bo1), XU Kewei3) |
1) Key Laboratory of Radiation Physics and Technology, Ministry of Education,Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064
2) Center of Analysis and Test, Sichuan University, Chengdu 610064
3) State Key Laboratory for Mechanical Behavior of Materials,College of Materials Science and Engineering,Xi'an Jiaotong University, Xi'an 710049 |
引用本文:
张彦坡,任丁,林黎蔚,杨斌,王珊玲,刘波,徐可为. Cu/Cu(Ge, Zr)/SiO2/Si多层膜界面可控反应及热稳定性研究[J]. 金属学报, 2013, 49(10): 1264-1268.
ZHANG Yanpo,
REN Ding,
LIN Liwei,
YANG Bin,
WANG Shanling,
LIU Bo1),
XU Kewei.
CONTROLLED REACTION ON INTERFACE OF Cu/Cu(Ge, Zr)/SiO2/Si MULTILAYER FILM AND ITS THERMAL STABILITY[J]. Acta Metall Sin, 2013, 49(10): 1264-1268.
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