DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE

Acta Metall Sin

1997, Vol. 33

Issue (3): 320-324 DOI:

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DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE

WU Daxing; YANG Chuan; GAO Guoqing (Southwest Jiaotong University;Chengdu 610031)

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WU Daxing; YANG Chuan; GAO Guoqing (Southwest Jiaotong University;Chengdu 610031). DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE. Acta Metall Sin, 1997, 33(3): 320-324.

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Abstract Si3N4 thin film has been deposited on the matrixes of carbon steels, alloy structure steels, speed steels and stainless steels by using a direct current plasma chemical vapor deposition (DC-PCVD) device under controlling processing parameters. Component,structure, morphology and hardness of the film were measured. This thin film consists mainly of the component of Si3N4 with amorphous structure.

Key words: steel Si_3N_4 film DC-PCVD

Received: 18 March 1997

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https://www.ams.org.cn/EN/ OR https://www.ams.org.cn/EN/Y1997/V33/I3/320

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