Acta Metall Sin  2008, Vol. 44 Issue (3): 331-335     DOI:

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Study on the SiC-TaSi2/MoSi2 Multilayer Oxidation Protective Coating for Carbon/Carbon composites

HOU Dangshe; LI Kezhi; LI Hejun; FU Qiangang; WEI Jian; HE Yonggang

HOU Dangshe; LI Kezhi; LI Hejun; FU Qiangang; WEI Jian; HE Yonggang. Study on the SiC-TaSi2/MoSi2 Multilayer Oxidation Protective Coating for Carbon/Carbon composites. Acta Metall Sin, 2008, 44(3): 331-335 .

Abstract References Related Articles Recommended Metrics Download:  PDF(1040KB)  Export:  BibTeX | EndNote (RIS)       Abstract  A SiC-TaSi2/MoSi2 multilayer oxidation protective coating for carbon/carbon (C/C) composites was prepared by pack cementation. Effects of the content of Ta and Mo in the second-step pack powders on the microstructure and high temperature anti-oxidation property of the multi-coating were studied by XRD, SEM, EDS and isothermal oxidation test. The results show that the multi-coating prepared at the mol ratio of 1:1 of Ta and Mo has a thicker, denser structure than those at the mol ratios of 0:1, 1:3, 3:1 and 1:0, on which the stable and dense glassy SiO2 film could be formed during oxidation test. After 326h oxidation in air at 1500℃ and thermal cycling between 1500℃ and room temperature for 23 times, the weight loss of the coated specimen was only 0.97%, implying that the multi-coating prepared at the mol ratio of 1:1 of Ta and Mo has excellent oxidation protective ability and thermal shock resistance. Key words:  C/C composites      coating      oxidation resistance       Received:  23 July 2007      ZTFLH:  TG146   Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors HOU Dangshe LI Kezhi LI Hejun FU Qiangang WEI Jian HE Yonggang URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y2008/V44/I3/331 [1]Sun G L,Li H J,Qi L H,Wang Z W,Hu Z B,Chen Q. Acta Metall Sin,2006;42:1046 (孙国岭，李贺军，齐乐华，王兆伟，胡志彪，陈强．金属学报，2006；42：1046) [2]Buckley J D.Ceram Bull,1988;67:364 [3]Masao K,Shin K,Kuniyuki K,Nobutaka U,Yoshinari K. 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