Abstract In this paper Cu thin films with different texture components were deposited on Si(111) and Al2O3 substrates by magnetron sputtering technology at room temperature. And the dynamic scaling method was developed to characterize surface roughening of the two films. The result shows that the growth exponent increases when the intensity of Cu (111) orientation increases. A surface roughening mechanism of polycrystalline columnar films growth was proposed to explain this phenomena，in which the influence of grain configuration and grain boundary can be negligible and the texture component is an important factor for surface roughening process.
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