EFFECT OF Si ADDITION ON THE MICROSTRUCTURE AND ROOM TEMPERATURE TENSILE PROPERTIES OF HIGH Nb-TiAl ALLOY

doi:10.11900/0412.1961.2015.00075

Acta Metall Sin

2015, Vol. 51

Issue (7): 859-865 DOI: 10.11900/0412.1961.2015.00075

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EFFECT OF Si ADDITION ON THE MICROSTRUCTURE AND ROOM TEMPERATURE TENSILE PROPERTIES OF HIGH Nb-TiAl ALLOY

Liang YANG,Shubo GAO,Yanli WANG,Teng YE,Lin SONG,Junpin LIN(

)

State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083

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Liang YANG,Shubo GAO,Yanli WANG,Teng YE,Lin SONG,Junpin LIN. EFFECT OF Si ADDITION ON THE MICROSTRUCTURE AND ROOM TEMPERATURE TENSILE PROPERTIES OF HIGH Nb-TiAl ALLOY. Acta Metall Sin, 2015, 51(7): 859-865.

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Abstract

High Nb-TiAl alloys, which being regarded as a new generation TiAl alloy, had attracted more and more attention for their higher operating temperature and better oxidation resistance than conventional TiAl alloys. It was found that silicide particles in high Nb-TiAl alloys were Nb₅Si₃ rather than Ti₅Si₃ precipitated in TiAl alloys. In this work, the effect of Nb₅Si₃ phase on the microstructure and room-temperature tensile properties of high Nb-TiAl alloy was studied. The experimental results showed that the precipitation temperature of silicide was between 1000~1200 ℃. Precipitates located in the colony boundary, b(B2) segregation and between g/a₂ lamella. The tensile properties of as-cast alloy with Si addition increased. Because the formation of Nb₅Si₃ precipitates resulted in the reduction of Nb content, which was one of b(B2) phase stable elements. Therefore, the volume fraction of b(B2) phase obviously decreased due to Si addition. However, after heat treatments, the tensile properties of Si containing high Nb-TiAl alloy gradually reduced with the increasing of heat treatment temperature. Silicide particles which precipitated along lamella leaded to generation and propagation of cracks. Moreover, silicide particles further precipitated due to tensile stress which increased the rate of crack propagation. Si addition leaded to g phase area expanded. g single-phase region formed between 1280~1300 ℃. Silicide precipitated in colony boundary resulted in bulk g+b(B2) phases, which weaken the grain boundaries. While silicide precipitated in lamella leaded to formation of secondary g lath which split the initial lamella microstructure.

Key words: high Nb-TiAl alloy Si alloyed microstructure evolution room temperature tensile properties

Fund: Supported by National Basic Research Program of China (No.2011CB605500) and National Natural Science Foundation of China (No.51271016)

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	Liang YANG
	Shubo GAO
	Yanli WANG
	Teng YE
	Lin SONG
	Junpin LIN

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https://www.ams.org.cn/EN/10.11900/0412.1961.2015.00075 OR https://www.ams.org.cn/EN/Y2015/V51/I7/859

Table 1 Processes of heat treatments for as-cast Ti-45Al-8Nb-2Mn-0.5Si (US) alloy

Fig.1 SEM-BSE images (a, b) and EBSD images (c, d) of Ti-45Al-8Nb-2Mn (UM) alloy (a, c) and US alloy (b, d) (Inset in Fig.1b shows the high magnified image of rectangular area)

Table 2 Phase compositions of UM and US alloys

Fig.2 SEM-BSE images of sample HT1 (a), HT2 (b), HT3 (c) and HT4 (d) in US alloy (Inset in Fig.2b shows the high magnified image of rectangular area)

Fig.3 TEM images and SAED patterns (insets) of e₂ phase (a) and e₃ phase (b) in sample HT3, and HRTEM image of the e₃/g interface (c) (The corresponding FFT image is shown in the lower right, the inverse FFT image of interface dislocation is shown in the upper right in Fig.3c)

Fig.4 Room temperature tensile properties of samples

Fig.5 The quasi-phase diagram of 8Nb-TiAl^[25]

Fig.6 DSC curves of UM (a) and US (b) alloys

Fig.7 Secondary electron image (a) and EBSD image (b) of tensile fracture interface of sample HT2

Fig.8 SEM-BSE images of e₁ precipitation in grain boundary (a), and e₂ and e₃precipitations in lamella in sample HT4 (Inset in Fig.8a shows the high magnified image of rectangular area)

Fig.9 TEM image of cross lamella (rectangular area in Fig.8b) in sample HT4

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