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用DC-PCVD装置对钢沉积Si_3N_4薄膜 |
吴大兴;杨川;高国庆 |
西南交通大学;成都;610031;西南交通大学;成都;610031;西南交通大学;成都;610031 |
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DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE |
WU Daxing; YANG Chuan; GAO Guoqing (Southwest Jiaotong University;Chengdu 610031) |
引用本文:
吴大兴;杨川;高国庆. 用DC-PCVD装置对钢沉积Si_3N_4薄膜[J]. 金属学报, 1997, 33(3): 320-324.
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DEPOSITION OF Si_3N_4 THIN FILM ON STEELS BY DC-PCVD DEVICE[J]. Acta Metall Sin, 1997, 33(3): 320-324.
1 Aron P R,Grill A.Thin Solid Films,1982;96:87 2 GrillA, Aron P R. Thin Solid Films, 1983;108:173 3吴大兴,周海,杨川,高国庆.硅酸盐学报,1992;20:248 4 Gupta Manju,Rothi V K,Thangara R,Agmihotri O P.Thin Solid Films,1991;204:77 5王建琪,胡文辉,冯大明电子能谱(UPS)学引论.北京:国防工业出版社,1992:2 6甑汉生.薄膜科学与技术,1988;1(1):10 7宇田川和,柳田博明,须藤仪一著,钱钧,安时天,张中,金宗哲,何欧里译.新型无机硅化合物(基础与应用).北京:中国建筑工业出版社,1989:12 8王一禾,杨膺善.非晶态合金.北京:冶金工业出版社,1989:124 |
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