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Co对弧光放电离子镀WC-Co膜生长的影响 |
于力;金柱京;黄燕清;朱天锦;吉川一功 |
中国科学院金属腐蚀与防护研究所腐蚀科学开放研究实验室;日本东海大学 |
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EFFECT OF Co CONTENT ON GROWTH OF ARC DISCHARGE ION-PLATING WC-Co FILM |
YU Li; JIN Zhujing (Corrosion Science laboratory; Institute of Corrosion and Protection of Metals; Chinese Academy of Sciences; Shenyang); HUANG Yanqing; ZHU Tianjin; KICHIKAW A Ichiko (College of Engineering; Tokai University; Japan) |
引用本文:
于力;金柱京;黄燕清;朱天锦;吉川一功. Co对弧光放电离子镀WC-Co膜生长的影响[J]. 金属学报, 1994, 30(17): 229-232.
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EFFECT OF Co CONTENT ON GROWTH OF ARC DISCHARGE ION-PLATING WC-Co FILM[J]. Acta Metall Sin, 1994, 30(17): 229-232.
1RandhawaH,JohnsonPC,SurfCoatTechnol,1987;31:303—3182BoelensS,VeltropH,SurfCoatTechnol,1987;33:63—713MuenzW.JVacSciTechnol,1986;A4:27174材料导报,1992;69(5):24—295日本金属学会编.金属便览,1960:2726甄汉生.等离子体加工技术,北京:清华大学出版社1990:15—217水口清原.日本东海大学工学部硕士毕业论文,19908ThorntonJA.JVacSciTechnol.1974;11:6669EcketovaL著.王广阳等译.薄膜物理学.北京:科学出版社1986:68—96 |
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