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STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION |
WANG Fengping;CUI Mingqi; WANG Peixuan; FANG Zhengzhi University; of Science and Technology Beijing; Beijing 100083 Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039(Manuscript received 1995-10-04) |
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Cite this article:
WANG Fengping;CUI Mingqi; WANG Peixuan; FANG Zhengzhi University; of Science and Technology Beijing; Beijing 100083 Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039(Manuscript received 1995-10-04). STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION. Acta Metall Sin, 1996, 32(7): 774-778.
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Abstract W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry.Correspondent: WANG Fengping, Department of Material Physics, University of Science and Technology Beijing, Beijing 100083
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Received: 18 July 1996
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1SpillerE,YounKB.SPIE,1993;2011:2882CatichaA.SPIE,1992;1740:813BarbeeJrTW,SPIE,1985;563:24姜晓明.中国科技大学博士学位论文,19895 BerningPH.PhysThinFilms,1963;1:696 UnderwoodJH,BarbeeJrTW.AIPConferenceProceedings,1981;75:1707BoercherDB.SPIE,1991;1547:478李云奇.真空镀膜技术与设备,19899 SpillerE.In:DhezP,WeisbuchCeds.Physics,FabricationandApplicationofMultilayeredStructures.NewYork:Plenum,1987:27 |
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