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Acta Metall Sin  1996, Vol. 32 Issue (7): 774-778    DOI:
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STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION
WANG Fengping;CUI Mingqi; WANG Peixuan; FANG Zhengzhi University; of Science and Technology Beijing; Beijing 100083 Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039(Manuscript received 1995-10-04)
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WANG Fengping;CUI Mingqi; WANG Peixuan; FANG Zhengzhi University; of Science and Technology Beijing; Beijing 100083 Institute of High Energy Physics; Chinese Academy of Sciences; Beijing 100039(Manuscript received 1995-10-04). STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION. Acta Metall Sin, 1996, 32(7): 774-778.

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Abstract  W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry.Correspondent: WANG Fengping, Department of Material Physics, University of Science and Technology Beijing, Beijing 100083
Key words:  multilayer      low-angle X-ray diffraction      interface roughness      magnetron sputtering     
Received:  18 July 1996     
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