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| Thermal Stability of A Novel Ti-Si-C-N Superhard Nanocomposite Coating at Elevated Temperature |
| Yan Guo |
| 西安交通大学材料学院国家重点实验室 |
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Cite this article:
Yan Guo. Thermal Stability of A Novel Ti-Si-C-N Superhard Nanocomposite Coating at Elevated Temperature. Acta Metall Sin, 2006, 42(2): 172-176 .
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Abstract Superhard nanocomposite Ti-Si-C-N coatings were deposited on substrate of high speed steel using an industrial pulsed d.c. plasma chemical vapor deposition set-up. Dependence of Si and C contents and annealing at elevated temperatures on the microstructure and hardness of Ti-Si-C-N coatings were investigated. Detailed microstructure examined by means of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) suggested that the Ti-Si-C-N coatings was a nanocomposite structure composed of nanocrystalline Ti(C,N) and amorphous carbon and Si3N4. And the crystalline size and microhardness of coatings showed high thermal stability even at 1000° C when Si and C contents were higher of 12.1 at.% Si, 32.9 at.% C. The possible origin of high thermal stability of superhard nanocomposite Ti-Si-C-N coatings is explained by spinodal decomposition that occurs during deposition.
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Received: 20 May 2005
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