Acta Metall Sin  1996, Vol. 32 Issue (9): 949-954    DOI:

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INFLUENCES OF Y~+-IMPLANTATION ON GROWTH STRESS OF OXIDE SCALE FORMED ON ALUMINIZED Ni-BASE ALLOY

XIN Li; LI Meishuan; LI Tiefan (Corrosion Science Laboratory; Institute of Corrosion and Protection of Metals; Chinese Academy of Sciences; Shenyang 110015)

XIN Li; LI Meishuan; LI Tiefan (Corrosion Science Laboratory; Institute of Corrosion and Protection of Metals; Chinese Academy of Sciences; Shenyang 110015). INFLUENCES OF Y~+-IMPLANTATION ON GROWTH STRESS OF OXIDE SCALE FORMED ON ALUMINIZED Ni-BASE ALLOY. Acta Metall Sin, 1996, 32(9): 949-954.

Abstract References Related Articles Recommended Metrics Download:  PDF(448KB)  Export:  BibTeX | EndNote (RIS)       Abstract  The influences of implanted yttrium with doses of 1×10~(17), 1×10~(16)Y~+/cm~2 on the growth stress of oxide scales formed on aluminized Ni-15Cr-6Al alloy were studied by using apparatus of oxide scale stress measurement. The experimental results indicated that Y~+-implantation at the two doses had no effects on the oxidation kinetics of the alloy, but decreased the growth stress in the oxide scale formed at 1100℃. The results are discussed. The reason that ion implantation with two doses decreases the growth stress and improves the adhension of alumina scale may be that Y~+- implantation changes the oxidation mechanism of the scale and facilitates the plastic deformation of the scale. Key words:  oxidation      growth stress      Y~+-implantation      aluminized Ni-based alloy      Received:  18 September 1996      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1996/V32/I9/949 1ChoquetP,MevrelR．MaterSciEng,1989;A120:1532JedlinskiJ．In:LangEed．,TheRoleofActiveElementsintheOxidationBehaviourofHikhTemperatureMetalsandAlloys,London:ElsevierScience,1989:1313DelauneyD,HuntzAM．JMaterSci,1982;17:20274彭晓,李铁藩,李美栓,马信清,陈全芳．周龙江中国稀土学报,1994,(12):3285李铁藩,李美栓．金属学报,1992;28:B2096LiMeishuan,LiTiefan．MaterSciTechnol,1993;9:677李铁藩,曲英哲．理化检验(物理分册),1986;22:68范玉殿主编．电子束和离子束加工．北京:机械工业出版社,1989:2999AshworthV,GrantWA,ProcterRPM．CorrosSci,1976;6:66110工程材料实用手册编辑委员会．工程材料实用手册,北京:中国标准出版社,1989;2:68111JedlinskiJ,GodlewskiK,MrowecS．MaterSciEng,1989;A121:53912SmialekJL,GibalaR．MetallTrans,1983;14A:214313RybickiGC,SmialekJL．OxidMet．1989;31:27514SchumamE．OxidMet,1995;43:15715FintBA,HobbsW．JElectrochemSoc,1994;141:244316辛丽,李美栓,李铁藩．中国腐蚀与防护学报,1996;16;4217SamsonovGV．TheOxideHandbook．NewYork:IFI//Plenum,1982:1918DelauneyD,HuntzAM,LacombeP．CorrosSic,1980;20:110919RamanarayananTA,RaghavanM,PetkviclutonR．JElectrochemSoc,1984,131:92320JedlinskiJ,BorchardtD．OxidMet．1991;36:317 [1] HUANG Ding, QIAO Yanxin, YANG Lanlan, WANG Jinlong, CHEN Minghui, ZHU Shenglong, WANG Fuhui. 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