金属学报  2011, Vol. 47 Issue (5): 566-572    DOI: 10.3724/SP.J.1037.2010.00686

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轴对称磁场对电弧离子镀TiN薄膜结构及摩擦性能的影响

肖金泉1), 郎文昌1, 2), 赵彦辉1), 宫骏1), 孙超1), 闻立时1)

1)  中国科学院金属研究所, 材料表面工程研究部, 沈阳 110016 2)  温州职业技术学院, 材料成型工艺与模具技术重点实验室, 温州 325035

INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON MICROSTRUCTURE AND FRICTION PERFORMANCE OF TIN FILM DEPOSITED BY ARC ION PLATING

XIAO Jinquan1), LANG Wenchang1, 2), ZHAO Yanhui1), GONG Jun1), SUN Chao1), WEN Lishi1)

1) Division of Surface Engineering of Materials, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 2) Key Lab of Material Processing and Mould Technology, Wenzhou Vocational $\&$ Technical College, Wenzhou 325035

肖金泉 郎文昌 赵彦辉 宫骏 孙超 闻立时. 轴对称磁场对电弧离子镀TiN薄膜结构及摩擦性能的影响[J]. 金属学报, 2011, 47(5): 566-572.
, , , , , . INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON MICROSTRUCTURE AND FRICTION PERFORMANCE OF TIN FILM DEPOSITED BY ARC ION PLATING[J]. Acta Metall Sin, 2011, 47(5): 566-572.

摘要 参考文献 相关文章 Metrics 全文: PDF(1237 KB)   摘要: 利用轴对称磁场增强电弧离子镀工艺制备TiN薄膜, 对薄膜表面大颗粒尺寸、数量及大颗粒与薄膜的面积比进行了分析统计, 研究了轴对称磁场横向分量强度对薄膜表面大颗粒尺寸和数量、薄膜组织结构及摩擦性能的影响. 结果表明, 随着轴对称磁场横向分量强度的增加, 大颗粒的尺寸和数量大幅度减少, 不同尺寸大颗粒的形貌差别很大, TiN薄膜的(111)择优取向增强, 薄膜的晶粒尺寸减小且分布均匀; 同时, 薄膜的摩擦系数及其随时间的波动减小, 耐磨性增强. 关键词 ： 轴对称磁场,  电弧离子镀,  大颗粒,  组织结构,  摩擦性能     Abstract：Arc ion plating (AIP) has been widely used in the deposition of various kinds of thin solid films. In AIP process, cathode spot motion is the key factor because it affects the physical characteristics of arc plasma, the utilization of cathode materials, the ejection of macroparticles (MPs) and the quality of subsequent films. It has been found that the cathode spot can be steered by an external magnetic field, such as an axisymmetric magnetic field (AMF). In this work, a new AMF produced by using an adjustable electromagnetic coil associated with a concentric magnetic flux guider was applied to the cathode surface to deposit TiN films, and it was focused on the influence of the AMF on the content and size of MPs, microstructure and friction performance of TiN films. The results show that the size and number of MPs decrease significantly with the increase in the transverse component of AMF. Meanwhile, the TiN film (111) preferred orientation enhances and its grain size decreases. Furthermore, the friction coefficient of films reduces and the wear resistance of films increases. Key words： axisymmetric magnetic field    arc ion plating    macroparticle    microstructure    riction performance 收稿日期: 2010-12-22      ZTFLH:  TB43，TG174.4   基金资助: 国家自然科学基金资助项目50801062 作者简介: 肖金泉, 男, 1952年生, 副研究员 服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 肖金泉 郎文昌 赵彦辉 宫骏 孙超 闻立时 44.8K 链接本文: https://www.ams.org.cn/CN/10.3724/SP.J.1037.2010.00686      或      https://www.ams.org.cn/CN/Y2011/V47/I5/566 [1] Kessler O, Herding Th, Hoffmann F, Mayr P. Surf Coat Technol, 2004; 182: 184 [2] Choy K L. Prog Mater Sci, 2003; 48: 57 [3] Schulz A, Mayra P, Staevesb J, Schmoeckelb D. Surf Coat Technol, 1997; 94: 446 [4] Wang D Y, Li Y W, Chang C L, Ho WY. Surf Coat Technol, 1999; 114: 109 [5] Clarysse F, Lauwerens W, Vermeulen M. Wear, 2008; 264: 400 [6] Sanders D M, Boercker D B, Falabella S. IEEE Trans Plasma Sci, 1990; 18: 883 [7] Vyskocil J, Musil J. Surf Coat Technol, 1990; 43: 299 [8] Boxman R L, Goldsmith S, Greenwood A. IEEE Trans Plasma Sci, 1997; 25: 1174 [9] Brown I G. 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