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| Si含量对电弧离子镀Ti-Al-Si-N薄膜组织结构和力学性能的影响 |
| 时婧1), 裴志亮1), 宫骏1), 孙超1), MUDERS C M2), 姜辛2) |
1) 中国科学院金属研究所金属腐蚀与防护国家重点实验室, 沈阳 110016
2) Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Strasse 9-11, Siegen 57076, Germany |
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| EFFECT OF Si CONTENT ON THE MICROSTRUCTURE AND MECHANICAL PROPERTIES OF Ti-Al-Si-N FILMS DEPOSITED BY CATHODIC VACUUM
ARC ION PLATING |
| SHI Jing1), PEI Zhiliang1),GONG Jun1), SUN Chao1), MUDERS C M2), JIANG Xin2) |
1) State Key Laboratory for Corrosion and Protection, Insititute of Metal Research, Chinese Academy of Sciences, Shenyang
2) Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Strasse 9-11, Siegen 57076, Germany |
引用本文:
时婧 裴志亮 宫骏 孙超 MUDERS C M 姜辛. Si含量对电弧离子镀Ti-Al-Si-N薄膜组织结构和力学性能的影响[J]. 金属学报, 2012, 48(11): 1349-1356.
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EFFECT OF Si CONTENT ON THE MICROSTRUCTURE AND MECHANICAL PROPERTIES OF Ti-Al-Si-N FILMS DEPOSITED BY CATHODIC VACUUM
ARC ION PLATING[J]. Acta Metall Sin, 2012, 48(11): 1349-1356.
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