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Acta Metall Sin  1997, Vol. 33 Issue (6): 650-654    DOI:
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INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM
HUO Xiao; REN Jialie; Lu Anli (Tsinghua Universitv; Beijing 100084)
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HUO Xiao; REN Jialie; Lu Anli (Tsinghua Universitv; Beijing 100084). INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM. Acta Metall Sin, 1997, 33(6): 650-654.

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Abstract  Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.
Key words:  diamond film      nonuniform deposition      mechanism     
Received:  18 June 1997     
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https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1997/V33/I6/650

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