|
|
INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM |
HUO Xiao; REN Jialie; Lu Anli (Tsinghua Universitv; Beijing 100084) |
|
Cite this article:
HUO Xiao; REN Jialie; Lu Anli (Tsinghua Universitv; Beijing 100084). INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM. Acta Metall Sin, 1997, 33(6): 650-654.
|
Abstract Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.
|
Received: 18 June 1997
|
1 Kobashi K, Nishimura, K, Kawate Y, Horiuchi T Phys,Rev B,1988; 38: 4067 2 Chow L,Horner A,Sakouri H,Roghani B,Sundaram S.J Maler Res,1992;7:1606 3霍晓,任家烈,鹿安理.航空材料学报,1994;14(3):42 4 Spitzer L.完全电离气体的物理学,左耀等译,北京:科学出版社, 1959: 39 5 Rau H,Picht F.J Phys D:Appl Phys, 1993;26: 1260 6甄汉生.等离子体加工技术,北京:清华大学出版社,1990:111 7 Rousseau A,Granier A,Gousset G,Leprince P.J Phys D,Appl Phys,1994;27: 1412 8 Karoulina E V,Lebedev Y A,J Phys.D Appl Phys,1992;25:401 9俞辉.中国科学院电子学研究所硕士学位论文,1987:68 10 霍晚.清华大学博士学位论文,1995:37,77& |
No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|