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TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE |
LIU Changqing; LI Meishuan; JIN Zhujing; WU Weitao (Corrosion Science Lab.; Institute of Corrosion and Protection of Metals; Academia Sinica. Shenyang 110015) |
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Cite this article:
LIU Changqing; LI Meishuan; JIN Zhujing; WU Weitao (Corrosion Science Lab.; Institute of Corrosion and Protection of Metals; Academia Sinica. Shenyang 110015). TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE. Acta Metall Sin, 1992, 28(9): 91-94.
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Abstract The cantilever bending test, particularly monitored by an acoustic emission technique, was adopted to measure the tensile and interfacial adhesive strengths of the HCD ion-plated fine TiN film on pure Ti substrate. The behaviours of film damaging were found due to: for TiN facing upward, an exceeded internal tensile stress over its tensile strength, and for TiN facing downward, an exceeded shearing stress along film/substrate interface over its adhesive strength. The measured tensile and adhesive strengths are 603 and 242 MPa respectively.
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Received: 18 September 1992
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1 Wu W, Liu C, Jin Z, Yu L, Shi C, Mater Sci Eng, 1991; A131: 203. 2 Randhawa H. J Vac Sci Technol, 1986; A4: 2755. 3 Coghill M E, St John D H, Surf Coat Technol, 1990; 41: 135. 4 Perry A J, Thin Solid Films, 1981; 78: 77. 5 刘长清,金柱京,吴维(屮又),戴少侠,李美栓,师昌绪,金属学报,1990;26:B27` |
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