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脉冲偏压电弧离子镀C--N--Cr薄膜的成分、结构与性能 |
李红凯1;刘琪1;林国强2;董闯1 |
1. 大连理工大学材料科学与工程学院; 大连 116085
2. 大连理工大学物理与光电工程学院; 大连 116085 |
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COMPOSITION, MICROSTRUCTURE AND PROPERTIES OF C–N–Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING |
LI Hongkai 1; LIU Qi 1; LIN Guoqiang 2; DONG Chuang 1 |
1. School of materials science and engineering; Dalian University of Technology; Dalian 116085
2. School of physics and optoelectronic engineering; Dalian University of Technology; Dalian 116085 |
引用本文:
李红凯 刘琪 林国强 董闯. 脉冲偏压电弧离子镀C--N--Cr薄膜的成分、结构与性能[J]. 金属学报, 2009, 45(5): 610-614.
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COMPOSITION, MICROSTRUCTURE AND PROPERTIES OF C–N–Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING[J]. Acta Metall Sin, 2009, 45(5): 610-614.
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(李红凯, 林国强, 董闯, 闻立时. 金属学报, 2008; 44: 917) |
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