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金属学报  2009, Vol. 45 Issue (5): 610-614    
  论文 本期目录 | 过刊浏览 |
脉冲偏压电弧离子镀C--N--Cr薄膜的成分、结构与性能
李红凯1;刘琪1;林国强2;董闯1
1. 大连理工大学材料科学与工程学院; 大连 116085
2. 大连理工大学物理与光电工程学院; 大连 116085
COMPOSITION, MICROSTRUCTURE AND PROPERTIES OF C–N–Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING
LI Hongkai 1; LIU Qi 1; LIN Guoqiang 2; DONG Chuang 1
1. School of materials science and engineering; Dalian University of Technology; Dalian 116085
2. School of physics and optoelectronic engineering; Dalian University of Technology; Dalian 116085
引用本文:

李红凯 刘琪 林国强 董闯. 脉冲偏压电弧离子镀C--N--Cr薄膜的成分、结构与性能[J]. 金属学报, 2009, 45(5): 610-614.
, , , . COMPOSITION, MICROSTRUCTURE AND PROPERTIES OF C–N–Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING[J]. Acta Metall Sin, 2009, 45(5): 610-614.

全文: PDF(756 KB)  
摘要: 

用脉冲偏压电弧离子镀设备在保持偏压一致和工作气压恒定的条件下, 控制不同氮(N)流量,在硬质合金基体上制备了不同成分的C--N--Cr薄膜. 用SEM, XPS, GIXRD, 激光Raman谱和纳米压入等方法分别研究了薄膜的表面形貌、成分、结构与性能. 结果表明, 随着N流量增加, 薄膜中N含量先是线性增加然后趋于平缓, Cr含量先是基本保持不变然后线性减少. 在N流量不超过20 mL/min时,薄膜保持较高的硬度(>30 GPa)与弹性模量(>500 GPa); 当N流量超过20 mL/min时, 薄膜硬度与弹性模量急剧下降, 在N流量为100 mL/min时硬度与弹性模量仅为13.6与190.8 GPa.

关键词 C-N-Cr薄膜脉冲偏压电弧离子镀结构性能    
Abstract

Diamond–like carbon (DLC), which used to describe a wide range of amorphous carbon films containing sp3 bond, has been extensively studied and applied in the fields of mechanics, electronics, optics and medicine, due to their excellent properties, such as high hardness and wear resistance, low friction coefficient, high chemical inertness, low expansion coefficient, well biocompatibility, and so on. However, high internal stress and low thermal stability are the main problems in applications of DLC. On the one hand, high internal stress is generated in the growth process of DLC, which greatly reduces the adhesion strength of the film to substrate, making the film easily delaminate from the substrate. On the other hand, the DLC will graphitize and be obviously oxidized when the temperature is over 350 ℃, leading to the deterioration of properties evidently. Non–metal N has strong affinity with transition metal Cr and their compound CrN has high hardness and oxidation resistance. So it is expected that composite film with hard CrN crystalline phase imbedded within DLC amorphous matrix maybe obtained by doping N and Cr simultaneously. In this paper, the uniform, smooth and dense C–N–Cr films with different compositions were deposited on cemented carbide substrate at different nitrogen flow rates by pulsed bias arc ion plating. The surface morphology, composition, structure and properties of C–N–Cr films were investigated by SEM, GIXRD, XPS, Raman spectra and Nano–indentation, respectively. The results show that the nitrogen content in the C–N–Cr films increases linearly and then slowly with nitrogen flow rate increasing, while the Cr content first keeps stable and then decreases linearly. The C–N–Cr films have high hardness (>30 GPa) and elastic modulus (>500 GPa) when the nitrogen flow rate is not more than 20 mL/min, above which the hardness and elastic modulus decrease drastically and only have the value of 13.6 and 190.8 GPa when the nitrogen flow rate is 100 mL/min.

Key wordsC-N-Cr films    pulsed bias    arc ion plating    microstructure    property
收稿日期: 2008-10-22     
ZTFLH: 

TB43

 
基金资助:

国家高技术研究发展计划项目 2006AA03Z521和2007AA03Z221资助

作者简介: 李红凯, 男, 1982年生, 博士生

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(李红凯, 林国强, 董闯, 闻立时. 金属学报, 2008; 44: 917)

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