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电弧离子镀氧化铬涂层的组织结构及硬度 |
纪爱玲 汪伟 宋贵宏 |
中国科学院金属研究所; 沈阳110016 |
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引用本文:
纪爱玲; 汪伟; 宋贵宏 . 电弧离子镀氧化铬涂层的组织结构及硬度[J]. 金属学报, 2003, 39(9): 979-983 .
[1] Samsonov G V. The Oxide Handbook. 2nd ed., New York:IFI/Plenum, 1982: 192, 195 [2] Bhushan B, Theunissen G S A M , Li X D. Thin SolidFilms, 1997; 311: 67 [3] Zieren V, Jongh M D, Groenou A B V, Zon J B V,Lansinki P, Theunissen G S. IEEE Trans Magn, 1994;30: 340 [4] Zhang J L, Huang J, Ding C. J Them Spray Technol, 1998;7: 242 [5] Hones P , Levy F. J Mater Res, 1999; 14: 3629 [6] Kao A S, Doerner M F, Novotny V J. J Appl Phys, 1989;66: 5315 [7] Contoux G, Cosset F, Celerier A, Machet J. Thin SolidFilms, 1997; 292: 75 [8] Wang D Y, Lin J H, Ho W Y. Thin Solid Films, 1998;332: 295 [9] Bhushan B. Thin Solid Films, 1980; 3: 255 [10] Bermudez V M, DeSisto W J. J Vac Sci Technol, 2001; 19: 576 [11] Cheng C S, Gomi H, Sakata H. Phys Status Solidis, 1996; 155: 417 [12] Abass A K, Jaboori E M. Phys Status Solidis, 1989; 116: K111 [13] Han L M. Plasma Heat Treatment. Tianjin: Tianjin University Press, 1997: 178(韩立民.等离子热处理.天津:天津大学出版社,1997:178) [14] Hong M D. PhD Thesis, Dalian: Dalian University of Technology, 2002(黄美东.大连理工大学博士学位论文, 2002) [15] Auciello O, Kelly R. Beam Modification of Materials 1 ?Ion Bombardment Modification of Surfaces. Fundamentals and Application Amsterdam: Elservier Science Publishers, 1984: 56 [16] Igasaki Y, Mitsuhashi H. Thin Solid Films, 1980; 70: 17 [17] Hibbs M K, Hohansson B O, Sundgren J E, Helmersson U. Thin Solid Films, 1984; 122: 115a |
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