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电流密度对V-4Cr-4Ti合金基体上电沉积W涂层显微结构的影响 |
李绪亮,张迎春,江凡,王莉莉,刘艳红,孙宁波 |
北京科技大学材料科学与工程学院, 北京 100083 |
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EFFECTS OF CURRENT DENSITY ON MICROSTRUCTURE OF W COATING ON V-4Cr-4Ti ALLOY BY ELECTRODEPOSITION |
LI Xuliang, ZHANG Yingchun, JIANG Fan, WANG Lili, LIU Yanhong, SUN Ningbo |
School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 |
引用本文:
李绪亮,张迎春,江凡,王莉莉,刘艳红,孙宁波. 电流密度对V-4Cr-4Ti合金基体上电沉积W涂层显微结构的影响[J]. 金属学报, 2013, 49(6): 745-750.
LI Xuliang,
ZHANG Yingchun,
JIANG Fan,
WANG Lili,
LIU Yanhong,
SUN Ningbo.
EFFECTS OF CURRENT DENSITY ON MICROSTRUCTURE OF W COATING ON V-4Cr-4Ti ALLOY BY ELECTRODEPOSITION[J]. Acta Metall Sin, 2013, 49(6): 745-750.
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