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Acta Metall Sin  2006, Vol. 42 Issue (9): 993-997     DOI:
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SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION
Li Zhuguo;Yu Hailiang; Wu Yixiong;MIYAKE Shoji
上海交通大学材料学院
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Li Zhuguo; Yu Hailiang; Wu Yixiong; MIYAKE Shoji. SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION. Acta Metall Sin, 2006, 42(9): 993-997 .

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Abstract  Ti-Cu-N films containing approximately 0—10.0% Cu (atomic fraction) were synthesized by inductively coupled plasma assisted magnetron sputtering with two elemental targets. The effects of Cu content on film hardness and microstructure have been investigated. The addition of a small amount of Cu significantly enhanced film hardness. The Ti-Cu-N film containing 2.0%Cu has a superhard trait, with a hardness HV value of 42, which is nearly two times of that of pure TiN film. The Superhard Ti-Cu-N film was characterized as a nanocomposite structure, consisting of nanocolumns of TiN crystallites with nanocrystal Cu inside the column boundaries. The hardness enhancement was attributed to nanocomposite effect.
Key words:  magnetron sputtering      ion irradiation      nanocomposite film      hardness      
Received:  29 June 2005     
ZTFLH:  TB383  

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https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y2006/V42/I9/993

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