Please wait a minute...
金属学报  2011, Vol. 47 Issue (1): 123-128    DOI: 10.3724/SP.J.1037.2010.00268
  论文 本期目录 | 过刊浏览 |
纳米结构黑镍薄膜的电沉积机理
宋利晓, 张昭, 张鉴清, 曹楚南
浙江大学化学系, 杭州310027
ELECTROPLATING MECHANISM OF NANOSTRUCTURED BLACK Ni FILMS
SONG Lixiao, ZHANG Zhao, ZHANG Jianqing, CAO Chunan
Department of Chemistry, Zhejiang University, Hangzhou 310027
引用本文:

宋利晓 张昭 张鉴清 曹楚南. 纳米结构黑镍薄膜的电沉积机理[J]. 金属学报, 2011, 47(1): 123-128.
, , , . ELECTROPLATING MECHANISM OF NANOSTRUCTURED BLACK Ni FILMS[J]. Acta Metall Sin, 2011, 47(1): 123-128.

全文: PDF(974 KB)  
摘要: 采用直流电沉积技术在改性的Watt镀镍溶液中获得了纳米晶黑镍薄膜, 采用SEM和XRD对薄膜的表面形貌和相组成进行了表征, 采用循环伏安法和电化学阻抗谱对黑镍薄膜的初始电沉积行为进行了研究. 结果表明, 黑镍薄膜表面平整光亮, 具有纳米晶结构; 黑镍薄膜的电沉积过程遵循3D成核/生长机制; 随着阴极沉积电势(负偏压)的增大, 黄铜电极表面Ni的电沉积反应\linebreak 由UPD沉积、异质成核/生长转化为最终的同质成核/生长, 相应的电荷转移电阻Rt的值先增大然后减小; 在较高的阴极沉积电势作用下, 由于吸附H原子(H2分子)的结晶阻止作用和(镍)羟基化合物的吸附作用, 电沉积EIS图出现低频和超低频感抗弧.
关键词 纳米晶黑镍薄膜电镀循环伏安电化学阻抗谱    
Abstract:Nanocrystalline black nickel film has been obtained from a modified Watt bath by using DC (direct current) electroplating method, and characterized by using SEM and XRD. Meanwhile, the initial electroplating behavior of the nanocrystalline black Ni film was investigated using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The results showed that the black Ni film is substantially smooth and bright, and consists of particles with the mean size 51.4 nm. The deposition of black Ni film followed the mechanism of three-dimensional (3D) nucleation and subsequent grain growth. With the increase of the negative potential bias, the main deposition process of black Ni film onto brass changed from the under-potential deposition (UPD) through heterogeneous finally to homogeneous nucleation/growth, which consequently resulted in the initial increase and subsequently decrease of charge-transfer-resistance (Rt). At the high negative bias, the occurrence of the low and the ultra-low frequency inductive loops on EIS plots, can be attributed to the adsorptions of hydrogen atoms and the nickel hydroxyl compound onto cathode surface, which retarded the nucleation/growth process of nickel.
Key wordsnanocrystalline black nickel film    electroplating    cyclic voltammetry    electrochemical impedance spectroscopy
收稿日期: 2010-06-08     
ZTFLH: 

O646

 
基金资助:

国家自然科学基金项目50771092和21073162资助

作者简介: 宋利晓, 女, 1983年生, 硕士生
[1] Wieczerniak W, Tremmel R A. Plat Surf Finishing, 1982; 69(6): 90

[2] Costa G, Della V P, Ribeiro M J, Oliveira A P N, Monros G, Labrincha J A. Dyes Pigm, 2008; 71: 137

[3] Zhang W K, Xia X H, Huang H, Gan Y P, Wu J B, Tu J P. J Power Sources, 2008; 184: 646

[4] Cui G F, Li N, Li D Y, Zheng J, Wu Q L. Surf Coat Technol, 2006; 200: 6808

[5] Shashikala A R, Sharma A K, Bhandri D R. Sol Energy Mater Sol Cells, 2007; 91: 629

[6] Saxena V, Rani R U, Sharma A K. Surf Coat Technol, 2006; 201: 855

[7] Won Y S, Park S S, Lee J, Kim J Y, Lee S J. Appl Surf Sci, 2010; 257: 56

[8] Vaishya J S, Tripathi T C. Energy Conver Manage, 1986; 26: 291

[9] Zhang Z K, Cui Z L, Chen K Z. Chin Sci Bull, 1997; 42: 1535

[10] Nieman G W, Weertman J R, Siegel R W. Mater Res Symp Proc, 1994; 206: 493

[11] Wackelgard E. Sol Energy Mater Sol Cells, 1998; 56: 35

[12] Lira–Cantu M, Sabio A M, Brustenga A, G´omez–Romero P. Sol Energy Mater Sol Cells, 2005; 87: 685

[13] Margarita M H, Manuel P P, Nikola B, Ignacio G. J Electroanal Chem, 1998; 443: 81

[14] Margarita M H, Manuel P P, Nikola B, Ignacio G. Surf Sci, 1998; 399: 80

[15] Rani R U, Sharma A K, Minu C. J Appl Electrochem, 2010; 40: 333

[16] Li Y N, Liang Z Z, Liang J Q. Acta Phys Sin, 2010; 59: 4530

[17] Epelboin I, Joussellin M, Wiart R. J Electroanal Chem, 1981; 119: 61

[18] Epelboin I, Joussellin M. J Electroanal Chem, 1979; 101: 281

[19] Ma C B, Cao F H, Zhang Z, Zhang J Q. Appl Surf Sci, 2006; 253: 2251

[20] Nowak P, Socha R P, Kaisheva M, Fransaer J, Celis J P, Stoinov Z. J Appl Electrochem, 2000; 30: 429
[1] 夏大海, 计元元, 毛英畅, 邓成满, 祝钰, 胡文彬. 2024铝合金在模拟动态海水/大气界面环境中的局部腐蚀机制[J]. 金属学报, 2023, 59(2): 297-308.
[2] 潘成成, 张翔, 杨帆, 夏大海, 何春年, 胡文彬. 三维石墨烯/Cu复合材料在模拟海水环境中的腐蚀和空蚀行为[J]. 金属学报, 2022, 58(5): 599-609.
[3] 白杨, 王振华, 李相波, 李焰. 低压冷喷涂制备Al(Y)-30%Al2O3涂层及其海水腐蚀行为[J]. 金属学报, 2019, 55(10): 1338-1348.
[4] 杨玉林, 穆张岩, 范铮, 淡振华, 王莹, 常辉. 电化学脱合金制备纳米多孔Ag及其甲醛检测性能[J]. 金属学报, 2019, 55(10): 1302-1310.
[5] 陈思,秦飞,安彤,王瑞铭,赵静毅. 退火工艺对硅通孔填充Cu微结构演化与胀出行为的影响*[J]. 金属学报, 2016, 52(2): 202-208.
[6] 秦飞, 项敏, 武伟. 纳米压痕法确定TSV-Cu的应力-应变关系*[J]. 金属学报, 2014, 50(6): 722-726.
[7] 魏仁超, 许凤玲, 蔺存国, 唐晓, 李焰. 远青弧菌、硫酸盐还原菌及其混合菌种作用下 B10合金的海水腐蚀行为[J]. 金属学报, 2014, 50(12): 1461-1470.
[8] 傅欣欣, 董俊华, 韩恩厚, 柯伟. 低碳钢Q235在模拟酸雨大气腐蚀条件下的电化学阻抗谱监测*[J]. 金属学报, 2014, 50(1): 57-63.
[9] 周小卫,沈以赴. Ni-CeO2纳米镀层在酸性NaCl溶液中的腐蚀行为及电化学阻抗谱特征[J]. 金属学报, 2013, 49(9): 1121-1130.
[10] 牛云松,魏杰,赵健,胡家秀,于志明. 超声辅助电镀法纳米叠层Ni镀膜的制备与性能[J]. 金属学报, 2013, 49(12): 1617-1622.
[11] 厉英,丁玉石,崔绍刚,王常珍. 掺杂Sc的CaZrO3的制备及电学性能[J]. 金属学报, 2012, 48(5): 575-578.
[12] 张杰 宋秀霞 栾鑫 孙彩霞 段继周 侯保荣. 海藻希瓦氏菌对Zn-Al-Cd牺牲阳极的腐蚀性能影响[J]. 金属学报, 2012, 48(12): 1495-1502.
[13] 张昊 吴迪 张黎 段珍珍 赖志明 刘志权. Fe-Ni新型UBM薄膜的晶圆电镀工艺研究[J]. 金属学报, 2012, 48(10): 1273-1280.
[14] 郭少强 许立宁 常炜 密雅荣 路民旭. 3Cr管线钢CO2腐蚀实验研究[J]. 金属学报, 2011, 47(8): 1067-1074.
[15] 周合兵 梁曼 吕东生 许梦清 李伟善. 电镀Zn-In合金在碱性溶液中的电化学行为[J]. 金属学报, 2011, 47(8): 1055-1060.