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氮含量对脉冲偏压电弧离子镀CNx薄膜结构与性能的影响 |
李红凯;林国强;董闯;闻立时 |
大连理工大学三束材料改性国家重点实验室 |
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EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CNx FILMS DEPOSITED BY PULSED BIAS |
Hong-Kai LI;;;; |
引用本文:
李红凯; 林国强; 董闯; 闻立时 . 氮含量对脉冲偏压电弧离子镀CNx薄膜结构与性能的影响[J]. 金属学报, 2008, 44(8): 917-921 .
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EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CNx FILMS DEPOSITED BY PULSED BIAS[J]. Acta Metall Sin, 2008, 44(8): 917-921 .
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