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INHIBITORY ACTION OF Si ON GROWTH OF INTERFACIAL COMPOUND LAYER DURING HOT-DIP ALUMINIZING |
QIAN Weijiang;GU Wengui(Shanghai Iron and Steel Research Institute) |
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Cite this article:
QIAN Weijiang;GU Wengui(Shanghai Iron and Steel Research Institute). INHIBITORY ACTION OF Si ON GROWTH OF INTERFACIAL COMPOUND LAYER DURING HOT-DIP ALUMINIZING. Acta Metall Sin, 1994, 30(21): 403-406.
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Abstract Investigation was made of the structure and composition of the interfacial compound layer of hot-dip aluminized 08F steel strip influenced by an addition of 2 at.-%Si to the hot-dipping bath.Results show that Si enriches the interfacial layer to form compound Fe_2(AlSi)_5.The inhibitory action of Si on the growth of interfacial compound layer may be to fill the vacant sites in Fe_2Al_5, to retard the diffusion of Al and then to reduce the thickness of the layer.
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1顾国成,刘邦津.热浸镀.北京:化学工业出版社出版,1988.122刘邦津,吴凤珍.钢铁,1991;26:423NichollsJE.CorrTechnol.1964;11:164EggelerG,VogelH,FriedrichJ,KaescheH.ParketMetallogr,1985;22:1625LainerDI,KurakinAK.FizMetMetallov,1964;18:1456KomatsuN,NakamureM,FujitaH.JJphInstMet,1981;45:4167JonesRD,DennerSG.In:MetalFinishingSocietyofJapan,Proceedignsofthe10thWorldCongressinMetalFinishing,Kyoto,19808EggelerG,AuerW,KaescheH.JMaterialsScience,1986;21:3348 |
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