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Acta Metall Sin  1992, Vol. 28 Issue (9): 67-72    DOI:
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ANALYSES OF DEPOSITED PRODUCTS AND REANODIZED POROUS LUBRICATING FILM ON AI AFTER (NH_4)_2MoS_4 SOLUTION TREATMENT
JIANG Guang; WU Yinshun; LI Jiuqing; LIU Haiping (University of Science and Tech nology Beijing)
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JIANG Guang; WU Yinshun; LI Jiuqing; LIU Haiping (University of Science and Tech nology Beijing). ANALYSES OF DEPOSITED PRODUCTS AND REANODIZED POROUS LUBRICATING FILM ON AI AFTER (NH_4)_2MoS_4 SOLUTION TREATMENT. Acta Metall Sin, 1992, 28(9): 67-72.

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Abstract  Observations were carried out of the structure of sulphuric, oxalic or phosphoric films on AI after treatment of reanodizing and electrolytic depositing lubricant in (NH_4)_2MoS_4 solution, as well as of the deposited products by means of EMPA, TEM and energy spectroscopic analysis. The deposited products are compounds of S and Mo other than single MoS_2, and most of them deposited near the surface layer of the film. Some regular long pores without barrier layer occurred in the film, but the regular fine channels without relation to the structural element parameters of original anodized film were found in the thickened barrier layer of phosphoric film. Sulphur may be remained as molybdenum sulphide in the film during heating under Ar protective environment.
Key words:  Al      anodizing      reanodizing      lubricating film      MoS_2     
Received:  18 September 1992     
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https://www.ams.org.cn/EN/     OR     https://www.ams.org.cn/EN/Y1992/V28/I9/67

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