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STUDY OF (Ti,Al)N FILMS DEPOSITED BY DC MAGNETRON SPUTTERING |
JIANG Shengrui; PENG Dongliang; ZHAO Xueying; XIE Liang; LI Qiang(Lanzhou University) |
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Cite this article:
JIANG Shengrui; PENG Dongliang; ZHAO Xueying; XIE Liang; LI Qiang(Lanzhou University). STUDY OF (Ti,Al)N FILMS DEPOSITED BY DC MAGNETRON SPUTTERING. Acta Metall Sin, 1994, 30(17): 233-237.
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Abstract Deposition technique of (Ti,Al)N films sputtered in the Ar+N2 atmosphere using reactive DC magnetron method was studied. The hardness, wear resistance and oxidation resistance of (Ti,Al)N films are superior to those of TiN films. The AES results show that the superior antioxidation characteristic of (Ti,Al) N films at high temperatures results from the formation of protective Al2O3 layers as a result of selective oxidation of Al.
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1IkedaT,SatohH.ThinSolidFilms,1991;195:992JehnHA,HofmannS,RuckbornVE,MunzWD.JVacSciTechnol,1986;A4:27013JehnHA,HofmannS,MunzWD.ThinSolidFilms,1987;153:454张承忠.金属的腐蚀与保护.北京:冶金工业出版社,1985,90 |
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