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| Room-temperature deposition of amorphous titanium dioxide film by pulsed bias arc ion plating |
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| 大连理工大学三束材料改性国家重点实验室 |
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Cite this article:
. Room-temperature deposition of amorphous titanium dioxide film by pulsed bias arc ion plating. Acta Metall Sin, 2007, 43(5): 509-514 .
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Abstract Uniform and transparent amorphous titanium dioxide films were prepared on glass by pulsed bias arc ion plating at room temperature. The influence of pulsed bias on the film optical property was investigated by varying the bias from 0V to 900V. The results show the as-deposited films are amorphous. The bias greatly affects film optical property. The deposition rate first increase and then decrease with increasing the bias, and the peak appears at 100V. As the bias increases, the film absorption edge shifts to the red side first, and then to the blue. While the band gap almost keeps constant, about 3.27eV. The film deposited at 300V reaches atomic smoothness, and RRMS is 0.113nm, which results in the highest refractive index, and nλ＝550 is 2.51, more or equal to the maximum value reported ever.
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Received: 07 September 2006
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