THERMODYNAMICAL AND KINETIC INVESTIGA-TION OF FORMATION OF PERIODIC LAYERED STRUCTURE IN TiCu/Zn INTERFACE REACTION

doi:10.11900/0412.1961.2013.00771

Acta Metall Sin

2014, Vol. 50

Issue (8): 930-936 DOI: 10.11900/0412.1961.2013.00771

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THERMODYNAMICAL AND KINETIC INVESTIGA-TION OF FORMATION OF PERIODIC LAYERED STRUCTURE IN TiCu/Zn INTERFACE REACTION

WU Changjun^1,², ZHU Chenlu¹, SU Xuping^1,²(

), LIU Ya^1,², PENG Haoping³, WANG Jianhua^1,²

1 School of Materials Science and Engineering, Changzhou University, Changzhou 213164
2 Jiangsu Key Laboratory of Materials Surface Technology, Changzhou 213164
3 School of Petroleum Engineering, Changzhou University, Changzhou 213164

Cite this article:

WU Changjun, ZHU Chenlu, SU Xuping, LIU Ya, PENG Haoping, WANG Jianhua. THERMODYNAMICAL AND KINETIC INVESTIGA-TION OF FORMATION OF PERIODIC LAYERED STRUCTURE IN TiCu/Zn INTERFACE REACTION. Acta Metall Sin, 2014, 50(8): 930-936.

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Abstract

研究了TiCu/Zn扩散偶在390和450 ℃退火后的扩散层组织, 发现其扩散区域中形成了3类周期层片对, 且γ+TiZn₃层片对的厚度随温度升高而减小, 但与退火时间无关. 在TiCu/Zn扩散体系中, 反应扩散主要受Zn原子向TiCu基体端扩散控制, Zn原子扩散至TiCu基体界面附近优先形成TiZn₃, 而Ti原子穿过γ层和Cu原子穿过TiZn₃层向富Zn端长程扩散均很困难, Cu原子仅能通过短程扩散聚集形成γ相并长大. 周而复始, 扩散通道在γ+TiZn₃两相区中来回振荡形成周期层片对, 且其间距与形成的先后顺序无关. 温度的升高加快了原子扩散和TiZn₃层的形成, 使层片对变薄. 扩散通道往富Zn方向穿过三相区后, 在经过ε+TiZn₃和ε+Ti₃Zn₂₂两相区时, 同样由于Ti和Cu原子长程扩散困难, 形成ε+TiZn₃和ε+Ti₃Zn₂₂周期层片对.

Key words: TiCu/Zn diffusion couple periodic layer structure thermodynamics kinetics

Received: 27 November 2013

ZTFLH:

TG111.6

Fund: Supported by National Natural Science Foundation of China (Nos.51171031 and 51201023)

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	Changjun WU
	Chenlu ZHU
	Xuping SU
	Ya LIU
	Haoping PENG
	Jianhua WANG

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https://www.ams.org.cn/EN/10.11900/0412.1961.2013.00771 OR https://www.ams.org.cn/EN/Y2014/V50/I8/930

Fig.1 SEM-BSE images of diffusion region in TiCu/Zn diffusion couple after annealing at 390 ℃ for 24 h

Fig.2 Microstructures in the boundary of γ+TiZn₃ layers and ε+TiZn₃ layers (a) and ε+TiZn₃ layers and ε+Ti₃Zn₂₂ layers (b) in TiCu/Zn diffusion couple after annealing at 390 ℃ for 24 h

Fig.3 SEM-BSE image of diffusion region in TiCu/Zn diffusion couple after annealing at 450 ℃ for 2 h

Table 1 Chemical compositions of the noted layers in TiCu/Zn diffusion couple after annealing at 450 ℃ for 2 h corresponding to the positions in Fig. 3

Fig.4 Calculated formation enthalpy (DH_f) of Ti-Zn alloys and Cu-Zn alloys at 390 and 450 ℃

Fig.5 Zn-rich corner of Zn-Cu-Ti system at 450 ℃ and the diffusion path in TiCu/Zn diffusion couple at 450 ℃ (The dotted line connects the TiCu substrate and the liquid Zn phase)

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