LASER-IGNITED SELF-PROPAGATING BEHAVIOR OF SELF-SUPPORTING NANO-SCALED Ti/Al MULTILAYER FILMS

doi:10.11900/0412.1961.2013.00821

Acta Metall Sin

2014, Vol. 50

Issue (8): 937-943 DOI: 10.11900/0412.1961.2013.00821

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LASER-IGNITED SELF-PROPAGATING BEHAVIOR OF SELF-SUPPORTING NANO-SCALED Ti/Al MULTILAYER FILMS

AN Rong^1,²(

), TIAN Yanhong^1,², KONG Lingchao², WANG Chunqing^1,², CHANG Shuai²

1 Key Laboratory of Micro-Systems and Micro-Structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080
2 State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001

Cite this article:

AN Rong, TIAN Yanhong, KONG Lingchao, WANG Chunqing, CHANG Shuai. LASER-IGNITED SELF-PROPAGATING BEHAVIOR OF SELF-SUPPORTING NANO-SCALED Ti/Al MULTILAYER FILMS. Acta Metall Sin, 2014, 50(8): 937-943.

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Abstract

通过磁控溅射法并借助有机高分子牺牲层, 制备了具有不同调制结构的自支撑Ti/Al (调制比为1)纳米多层膜. 采用脉冲激光诱发了纳米多层膜的自蔓延反应, 确定了临界诱发能量密度. 利用高速摄影法表征了自蔓延速度, 采用SEM和TEM观察了纳米多层膜结构, 利用差热分析仪和XRD分析了反应过程及产物. 结果表明, 纳米多层膜激光诱发临界能量密度(6~17 J/cm²)高于烧蚀临界能量密度. 调制周期或周期数较小的纳米多层膜激光诱发所需的能量密度较小且自蔓延速度较高. 但当调制周期接近或小于层间原子互溶区厚度时, 临界能量密度和自蔓延速度的变化则有相反趋势. 对于一定厚度的纳米多层膜, 具有大调制周期和小周期数的调制结构对应的放热量大. 随激光脉冲持续时间的延长, Ti/Al纳米多层膜的激光临界诱发能量密度呈现递减趋势, 但最终趋于稳定. 激光诱发Ti/Al纳米多层膜自蔓延反应生成单一的TiAl金属间化合物.

Key words: nano-scaled multilayer film self-supporting self-propagation modulation structure pulsed laser

Received: 17 December 2013

ZTFLH:	TG42
	O532

Fund: Supported by National Natural Science Foundation of China (No.51005055) and Fundamental Research Funds for the Central Universities (No.HIT.NSRIF.2015066)

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	Rong AN
	Yanhong TIAN
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	Chunqing WANG
	Shuai CHANG

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https://www.ams.org.cn/EN/10.11900/0412.1961.2013.00821 OR https://www.ams.org.cn/EN/Y2014/V50/I8/937

Fig.1 SEM (a) and TEM (b) images of cross-sectional microstructures of Ti/Al multilayer films (PMMA—polymethylmethacrylate)

Fig.2 High-speed photographies of the self-propagating behavior of a Ti/Al multilayer filmas ignited (a) and after laser ignition for 2 ms (b), 8 ms (c) and 22 ms (d)

Fig.3 XRD spectra of Ti/Al multilayer films after self-propagating reaction

Fig.4 SEM-SE image of surface structure of a Ti/Al multilayer after laser-induced self-propagating reaction

Fig.5 Laser ignition fluence and reaction propagation rate for Ti/Al reactive multilayers as a function of modulation period

Fig.6 SEM-SE image of laser induced ablation morphology of a Ti/Al multilayer

Fig.7 Laser ignition fluence and reaction propagation rate for Ti/Al reactive multilayers as a function of modulation period numbers

Fig.8 DSC curves of the Ti/Al reactive multilayers with the same thickness but different modulated structures (P—modulation period, N—modulation period number)

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